SCHEMBL7759679

SCHEMBL7759679

CC(CCCCO)OC(=O)CCCCC(=O)OCCO

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.41
MGLL Q99685 1/20 0.40
PRKCA P17252 1/20 0.39
PRKCE Q02156 1/20 0.39
PRKCQ Q04759 1/20 0.39
PRKCD Q05655 1/20 0.39
LMNA P02545 3/20 0.39
ALDH1A1 P00352 1/20 0.38
FAAH O00519 5/20 0.38
CNR1 P21554 1/20 0.38
CNR2 P34972 1/20 0.38
EPHX2 P34913 1/20 0.37
MAPT P10636 2/20 0.37
MAPK1 P28482 1/20 0.37
DNM1 Q05193 1/20 0.35
CYP3A4 P08684 1/20 0.35
TSHR P16473 1/20 0.35
ATM Q13315 1/20 0.35
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6411243 0.90 LMNA (0.46) PRKCAPRKCEPRKCQPRKCDLMNA
SCHEMBL28729976 0.88 LMNA (0.48) PRKCAPRKCEPRKCQPRKCDLMNA
SCHEMBL17165699 0.84 GPR84 (0.44) DGKAPRKCAPRKCEPRKCQPRKCD
SCHEMBL21461650 0.83 FAAH (0.41) PRKCAPRKCEPRKCQPRKCDLMNA
SCHEMBL1003524 0.82 FFAR1 (0.53) LMNAALDH1A1FAAHCNR1CNR2
SCHEMBL13133199 0.82 LMNA (0.43) PRKCAPRKCEPRKCQPRKCDLMNA
SCHEMBL18641658 0.82 LMNA (0.61) DGKAPRKCAPRKCEPRKCQPRKCD
SCHEMBL21807009 0.82 LMNA (0.61) DGKAPRKCAPRKCEPRKCQPRKCD
SCHEMBL1880556 0.82 FFAR1 (0.53) LMNAALDH1A1FAAHCNR1CNR2
SCHEMBL6551006 0.82 LMNA (0.61) DGKAPRKCAPRKCEPRKCQPRKCD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0712879-B1 Ester amide block copolymer and process for producing same TOSOH CORP (JP) 2001-08-08 EP disclosed
EP-1088845-A2 Ester-amide block copolymers and process for producing same TOSOH CORPORATION (JP) 2001-04-04 EP disclosed
US-5760143-A HEAT AND AGING RESISTANCE; HIGH STRENGTH; OIL REPELLANTS TOSOH CORPORATION (JP) 1998-06-02 US disclosed
EP-0712879-A1 Ester amide block copolymer and process for producing same Tosoh Corporation (JP) 1996-05-22 EP disclosed