Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.44 |
| ▸ | HMGCR | P04035 | 1/20 | 0.42 |
| ▸ | BCL2 | P10415 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | UBE2N | P61088 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | DRD3 | P35462 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | PPARG | P37231 | 1/20 | 0.37 |
| ▸ | PPARA | Q07869 | 1/20 | 0.37 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.37 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.37 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15314345 | 0.85 | BCL2 (0.61) | BCL2PPARGPPARAPTPN2PTPN1 | |
| SCHEMBL7773855 | 0.85 | ALDH1A1 (0.52) | HMGCRBCL2HSD17B10ALDH1A1HPGD | |
| SCHEMBL7773975 | 0.80 | HTT (0.51) | HSD17B10KDM4EMAPTMEN1KMT2A | |
| SCHEMBL3657409 | 0.79 | MEN1 (0.47) | BCL2HSD17B10KDM4EMAPTMEN1 | |
| SCHEMBL9468226 | 0.79 | PLA2G2A (0.53) | KDM4EMAPTMEN1KMT2AALDH1A1 | |
| SCHEMBL7773832 | 0.79 | PLA2G2A (0.53) | KDM4EMAPTMEN1KMT2AALDH1A1 | |
| SCHEMBL7773963 | 0.79 | PLA2G2A (0.53) | KDM4EMAPTMEN1KMT2AALDH1A1 | |
| SCHEMBL7775778 | 0.79 | PLA2G2A (0.53) | KDM4EMAPTMEN1KMT2AALDH1A1 | |
| SCHEMBL27589936 | 0.74 | MEN1 (0.56) | HSP90AB1HMGCRHSD17B10KDM4EMAPT | |
| SCHEMBL15314352 | 0.73 | BCL2 (0.54) | HSP90AB1HMGCRBCL2MEN1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0445819-B1 | Positive type photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2001-08-22 | — | — | EP | disclosed |
| EP-0488686-B1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORP (US) | 1995-09-27 | — | — | EP | disclosed |
| EP-0508269-B1 | Radiation-sensitive ester and process for its production | HOECHST AG (DE) | 1995-02-01 | — | — | EP | disclosed |
| EP-0369219-B1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AG (DE) | 1995-01-04 | — | — | EP | disclosed |
| US-5300396-A | Process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORPORATION (US) | 1994-04-05 | — | — | US | disclosed |
| US-5268252-A | Polyol with o-naphthoquinone-2-diazide-4-sulfonic acid | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-12-07 | — | — | US | disclosed |
| US-5256522-A | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | HOECHST CELANESE CORPORATION (US) | 1993-10-26 | — | — | US | disclosed |
| EP-0244763-B1 | POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RECORDING MATERIAL PREPARED THEREFROM | HOECHST CELANESE CORPORATION (US) | 1993-03-10 | — | — | EP | disclosed |
| US-5162510-A | Prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide | HOECHST CELANESE CORPORATION (US) | 1992-11-10 | — | — | US | disclosed |
| EP-0508269-A1 | Radiation-sensitive ester and process for its production | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-14 | — | — | EP | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0264845-A2 | Multilayer positive-registration material | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| EP-0244763-A2 | Positive-working photosensitive composition and photosensitive recording material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0244762-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243964-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-04 | — | — | EP | disclosed |
| EP-0052788-B1 | PHOTOSENSITIVE MIXTURE BASED ON O-NAPHTHOQUINONE DIAZIDES, AND PHOTOSENSIBLE COPYING MATERIAL MADE THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-08-01 | — | — | EP | disclosed |
| US-4407926-A | PHOTORESISTS, PRINTING PLATES | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-10-04 | — | — | US | disclosed |
| EP-0052788-A1 | Photosensitive mixture based on o-naphthoquinone diazides, and photosensible copying material made therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-06-02 | — | — | EP | disclosed |