Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G2A | P14555 | 2/20 | 0.53 |
| ▸ | PLA2G5 | P39877 | 2/20 | 0.53 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.53 |
| ▸ | HTT | P42858 | 2/20 | 0.50 |
| ▸ | HSD17B3 | P37058 | 6/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | ELANE | P08246 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.40 |
| ▸ | CES2 | O00748 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7773963 | 1.00 | PLA2G2A (0.53) | PLA2G2APLA2G5FFAR1HTTHSD17B3 | |
| SCHEMBL9468226 | 1.00 | PLA2G2A (0.53) | PLA2G2APLA2G5FFAR1HTTHSD17B3 | |
| SCHEMBL7773832 | 1.00 | PLA2G2A (0.53) | PLA2G2APLA2G5FFAR1HTTHSD17B3 | |
| SCHEMBL7773975 | 0.98 | HTT (0.51) | PLA2G2APLA2G5FFAR1HTTHSD17B3 | |
| SCHEMBL15313678 | 0.87 | BCL2 (0.53) | PLA2G2APLA2G5FFAR1HTTMEN1 | |
| SCHEMBL7773855 | 0.86 | ALDH1A1 (0.52) | PLA2G2APLA2G5FFAR1HTTHSD17B3 | |
| SCHEMBL9636706 | 0.84 | HTT (0.43) | PLA2G2APLA2G5FFAR1HTTHSD17B3 | |
| SCHEMBL5921518 | 0.80 | PLA2G2A (0.49) | PLA2G2APLA2G5FFAR1HTTHSD17B3 | |
| SCHEMBL9468232 | 0.79 | PLA2G2A (0.55) | PLA2G2APLA2G5FFAR1HTTHSD17B3 | |
| SCHEMBL15313671 | 0.78 | PLA2G2A (0.54) | PLA2G2APLA2G5FFAR1HTTHSD17B3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0445819-B1 | Positive type photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2001-08-22 | — | — | EP | disclosed |
| EP-0488686-B1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORP (US) | 1995-09-27 | — | — | EP | disclosed |
| EP-0508269-B1 | Radiation-sensitive ester and process for its production | HOECHST AG (DE) | 1995-02-01 | — | — | EP | disclosed |
| EP-0369219-B1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AG (DE) | 1995-01-04 | — | — | EP | disclosed |
| US-5300396-A | Process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORPORATION (US) | 1994-04-05 | — | — | US | disclosed |
| US-5256522-A | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | HOECHST CELANESE CORPORATION (US) | 1993-10-26 | — | — | US | disclosed |
| EP-0244763-B1 | POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RECORDING MATERIAL PREPARED THEREFROM | HOECHST CELANESE CORPORATION (US) | 1993-03-10 | — | — | EP | disclosed |
| US-5162510-A | Prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide | HOECHST CELANESE CORPORATION (US) | 1992-11-10 | — | — | US | disclosed |
| EP-0508269-A1 | Radiation-sensitive ester and process for its production | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-14 | — | — | EP | disclosed |
| EP-0488686-A1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORPORATION (US) | 1992-06-03 | — | — | EP | disclosed |
| EP-0369219-A1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-05-23 | — | — | EP | disclosed |
| US-4902785-A | Phenolic photosensitizers containing quinone diazide and acidic halide substituents | HOECHST CELANESE CORPORATION (US) | 1990-02-20 | — | — | US | disclosed |
| US-4892801-A | PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1990-01-09 | — | — | US | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0264845-A2 | Multilayer positive-registration material | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| EP-0244762-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0244763-A2 | Positive-working photosensitive composition and photosensitive recording material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243964-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-04 | — | — | EP | disclosed |