⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3919468 | 0.77 | TP53 (0.31) | — | |
| SCHEMBL7769631 | 0.75 | FTO (0.32) | — | |
| SCHEMBL7775810 | 0.75 | FTO (0.32) | — | |
| SCHEMBL7775779 | 0.75 | — | — | |
| SCHEMBL6846705 | 0.72 | ACHE (0.32) | — | |
| SCHEMBL7777080 | 0.72 | LMNA (0.35) | — | |
| SCHEMBL3256213 | 0.69 | FTO (0.32) | — | |
| SCHEMBL30773362 | 0.69 | FTO (0.32) | — | |
| SCHEMBL7773878 | 0.69 | LMNA (0.35) | — | |
| SCHEMBL7769558 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0445819-B1 | Positive type photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2001-08-22 | — | — | EP | disclosed |
| EP-0443533-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1998-09-30 | — | — | EP | disclosed |
| EP-0445819-A2 | Positive type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-11 | — | — | EP | disclosed |
| EP-0443533-A2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-28 | — | — | EP | disclosed |