SCHEMBL7783201

SCHEMBL7783201

CC(C)(C)S(=O)(=O)S(=O)(=O)C1CCCCC1

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA7 P43166 1/20 0.31
CA14 Q9ULX7 1/20 0.31
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14606349 0.76 CA12 (0.31) CA12CA1CA7CA14
SCHEMBL547762 0.76 CA1 (0.41) CA12CA1CA7CA14EPHX2
SCHEMBL10147792 0.75 CA1 (0.33) CA12CA1CA7CA14EPHX2
SCHEMBL12364132 0.72
SCHEMBL491156 0.67 ACHE (0.32)
SCHEMBL1697213 0.67 PDK1 (0.33) CA12CA1CA7CA14
SCHEMBL10146064 0.67 CA12 (0.31) CA12CA1CA7CA14
SCHEMBL780033 0.66 CA1 (0.38) CA12CA1CA7CA14EPHX2
SCHEMBL20170489 0.66 CA1 (0.38) CA12CA1CA7CA14EPHX2
SCHEMBL11563645 0.66 CA1 (0.38) CA12CA1CA7CA14EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0827970-B1 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT FINANCE BVI LTD (VG) 2001-09-26 EP disclosed
US-5852128-A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT AG (CH) 1998-12-22 US disclosed
EP-0827970-A2 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Clariant AG (CH) 1998-03-11 EP disclosed
EP-0749046-A1 Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1996-12-18 EP disclosed