SCHEMBL7784533

SCHEMBL7784533

C=C(C)C(=O)NS(=O)(=O)c1ccc(OCCCC)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.57
LMNA P02545 3/20 0.57
MMP1 P03956 2/20 0.56
MMP13 P45452 2/20 0.56
ADAMTS4 O75173 1/20 0.56
MMP2 P08253 1/20 0.56
MMP14 P50281 1/20 0.56
ADAMTS5 Q9UNA0 1/20 0.56
CTDSP1 Q9GZU7 1/20 0.53
TSHR P16473 3/20 0.51
CA12 O43570 2/20 0.51
CA1 P00915 2/20 0.51
CA2 P00918 2/20 0.51
CA9 Q16790 2/20 0.51
CA7 P43166 1/20 0.51
BCL2L1 Q07817 1/20 0.49
MCL1 Q07820 1/20 0.49
MMP3 P08254 1/20 0.49
HTT P42858 2/20 0.47
CYP2C9 P11712 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7784535 0.81 MMP2 (0.57) MMP1MMP13MMP2CA12CA1
SCHEMBL7784451 0.77 KMT2A (0.44) SMN1; SMN2LMNATSHRCA12CA9
SCHEMBL6846124 0.77 TSHR (0.62) SMN1; SMN2LMNAMMP1MMP13ADAMTS4
SCHEMBL16659791 0.77 FFAR4 (0.49) SMN1; SMN2LMNAMMP1MMP13MMP2
Hydrochloric Acid SCHEMBL3367813 0.77 MMP1 (0.59) SMN1; SMN2LMNAMMP1MMP13ADAMTS4
SCHEMBL14926811 0.77 FAAH (0.59) SMN1; SMN2LMNACA12CA1CA2
SCHEMBL9179919 0.76 SMN1; SMN2 (0.55) SMN1; SMN2LMNAMMP1MMP13ADAMTS4
SCHEMBL195196 0.76 LMNA (0.56) SMN1; SMN2LMNAMMP1MMP13MMP2
SCHEMBL6846126 0.76 TSHR (0.64) SMN1; SMN2LMNAMMP1MMP13ADAMTS4
SCHEMBL3369995 0.74 MMP1 (0.58) SMN1; SMN2LMNAMMP1MMP13ADAMTS4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0671660-B1 Lead-frame forming material FUJI PHOTO FILM CO LTD (JP) 2001-10-17 EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 US disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed