SCHEMBL7789545

SCHEMBL7789545

CC1(C)OC(=O)C(=[N+]=[N-])C(=O)O1

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 4/20 0.39
ALDH1A1 P00352 12/20 0.34
LMNA P02545 3/20 0.34
HSD17B10 Q99714 1/20 0.34
HTT P42858 1/20 0.33
ACP1 P24666 2/20 0.32
CDC25B P30305 2/20 0.32
CRHBP P24387 1/20 0.32
CRHR2 Q13324 1/20 0.32
TSHR P16473 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
GAA P10253 1/20 0.31
MAPT P10636 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8749165 0.78 PTPN1 (0.41) PTPN1ACP1CDC25B
SCHEMBL9730908 0.74
SCHEMBL10926238 0.73 SIRT1 (0.46) ALDH1A1HTTTSHRSMN1; SMN2KMT2A
SCHEMBL11253677 0.69 PTPN1 (0.42) PTPN1ALDH1A1ACP1CDC25BCRHBP
SCHEMBL10360973 0.65 PTPN1 (0.43) PTPN1ALDH1A1LMNAHSD17B10HTT
SCHEMBL91068 0.65 PTPN1 (0.43) PTPN1ALDH1A1LMNAHSD17B10HTT
SCHEMBL18957266 0.65
SCHEMBL5117712 0.63
SCHEMBL12041925 0.63 ALDH1A1 (0.45) PTPN1ALDH1A1LMNAHSD17B10CRHBP
SCHEMBL7137575 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110272392-B Transition metal catalyzed C-H coupling for efficiently preparing 2- (4(3H) -quinazolinone) aryl alkyl acetate derivative 四川大学 2022-07-01 CN claimed
WO-2025064802-A1 INHIBITING HUMAN INTEGRIN α5β1 MORPHIC THERAPEUTIC, INC. (US) 2025-03-27 WO disclosed
CN-110272392-B Transition metal catalyzed C-H coupling for efficiently preparing 2- (4(3H) -quinazolinone) aryl alkyl acetate derivative 四川大学 2022-07-01 CN disclosed
US-20110170075-A1 DEVICE FOR CHEMICAL AND BIOCHEMICAL REACTIONS USING PHOTO-GENERATED REAGENTS THE REGENTS OF THE UNIVERSITY OF MICHIGAN 2011-07-14 US disclosed
US-7838466-B2 Device for chemical and biochemical reactions using photo-generated reagents THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2010-11-23 US disclosed
US-7544638-B2 Device for chemical and biochemical reactions using photo-generated reagents THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2009-06-09 US disclosed
US-7491680-B2 Device for chemical and biochemical reactions using photo-generated reagents THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2009-02-17 US disclosed
US-20080318806-A1 DEVICE FOR CHEMICAL AND BIOCHEMICAL REACTIONS USING PHOTO-GENERATED REAGENTS THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2008-12-25 US disclosed
EP-0799716-B1 Diazo compounds for laser-induced mass transfer imaging materials MINNESOTA MINING & MFG (US) 2001-11-07 EP disclosed
US-5998612-A Antibiotic synthesis MERCK SHARP & DOHME CORP. 1999-12-07 US disclosed
EP-0078026-B1 ANTIBIOTIC SYNTHESIS MERCK & CO. INC. (US) 1988-09-28 EP disclosed
US-4624909-A PHOTOSENSITIVITY, DIAZO COMPOUND, MICROELECTRONIC DEVICE, ETCHING NEC CORPORATION (JP) 1986-11-25 US disclosed
EP-0040535-B1 METHOD OF FORMING A MICROSCOPIC PATTERN, AND A PHOTORESIST Hitachi, Ltd. (JP) 1984-09-19 EP disclosed
EP-0029901-B1 LITHOGRAPHIC RESIST COMPOSITION FOR USE IN A METHOD OF FORMING A FILM ON A SUBSTRATE International Business Machines Corporation (US) 1983-05-11 EP disclosed
EP-0078026-A2 Antibiotic synthesis MERCK & CO. INC. (US) 1983-05-04 EP disclosed
EP-0020870-B1 LITHOGRAPHIC PHOTORESIST COMPOSITION International Business Machines Corporation (US) 1983-03-09 EP disclosed
US-4339522-A Ultra-violet lithographic resist composition and process INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1982-07-13 US disclosed
US-4284706-A Lithographic resist composition for a lift-off process INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1981-08-18 US disclosed
EP-0029901-A1 Lithographic resist composition for use in a method of forming a film on a substrate International Business Machines Corporation (US) 1981-06-10 EP disclosed
EP-0020870-A1 Lithographic photoresist composition International Business Machines Corporation (US) 1981-01-07 EP disclosed