SCHEMBL7792279

SCHEMBL7792279

O=[N+]([O-])c1cccc(C(F)(F)F)c1Cc1ccc(S(=O)(=O)O)c(Cc2c([N+](=O)[O-])cccc2C(F)(F)F)c1S(=O)(=O)O

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
DDX3X O00571 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
ENPP2 Q13822 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP9 P14780 1/20 0.31
MMP8 P22894 1/20 0.31
MMP13 P45452 1/20 0.31
P2RX1 P51575 1/20 0.31
ATM Q13315 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C19 P33261 1/20 0.31
CA12 O43570 1/20 0.31
GPR35 Q9HC97 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9550114 1.00 ALDH1A1 (0.35) ALDH1A1DDX3XMEN1KMT2ANPSR1
SCHEMBL7792275 1.00 ALDH1A1 (0.35) ALDH1A1DDX3XMEN1KMT2ANPSR1
SCHEMBL9550118 0.87 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ANPSR1ENPP2
SCHEMBL9550125 0.87 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ANPSR1ENPP2
SCHEMBL1607341 0.83 ALDH1A1 (0.39) ALDH1A1MEN1KMT2ACYP1A2CYP3A4
SCHEMBL3794759 0.81 CCR2 (0.41) ALDH1A1
SCHEMBL28038940 0.81 CCR2 (0.41) ALDH1A1
SCHEMBL7902462 0.79 KMT2A (0.38) ALDH1A1MEN1KMT2ANPSR1CA2
SCHEMBL7902467 0.79 KMT2A (0.38) ALDH1A1MEN1KMT2ANPSR1CA2
SCHEMBL8014629 0.76 ALDH1A1 (0.47) ALDH1A1NPSR1ENPP2ATMCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0731388-B1 An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material AT & T CORP (US) 2001-11-14 EP disclosed
US-5656412-A Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material LUCENT TECHNOLOGIES INC. (US) 1997-08-12 US disclosed
EP-0731388-A2 An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material AT&T Corp. (US) 1996-09-11 EP disclosed
EP-0546697-A1 Process for the bromination of deactivated toluenes in the benzylic position AT&T Corp. (US) 1993-06-16 EP disclosed
US-5200544-A Acid generator, acid sensitive polymer; photosensitivity AT&T BELL LABORATORIES (US) 1993-04-06 US disclosed
US-5135838-A Resin sensitive to UV radiation and a nitrobenzyl compound that generates an acid AT&T BELL LABORATORIES (US) 1992-08-04 US disclosed