SCHEMBL7902467

SCHEMBL7902467

COc1ccc(S(=O)(=O)O)c(Cc2c([N+](=O)[O-])cccc2C(F)(F)F)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.38
GAA P10253 1/20 0.38
LMNA P02545 3/20 0.38
ALDH1A1 P00352 2/20 0.38
POLB P06746 2/20 0.38
MCOLN3 Q8TDD5 1/20 0.38
MEN1 O00255 2/20 0.37
SLC40A1 Q9NP59 1/20 0.37
AR P10275 2/20 0.36
RELA Q04206 1/20 0.36
MAPT P10636 2/20 0.36
NPC1 O15118 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
RAB9A P51151 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
CA2 P00918 1/20 0.35
MMP1 P03956 1/20 0.35
MMP2 P08253 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7902462 1.00 KMT2A (0.38) KMT2AGAALMNAALDH1A1POLB
SCHEMBL1607341 0.86 ALDH1A1 (0.39) KMT2AGAALMNAALDH1A1POLB
SCHEMBL3794759 0.84 CCR2 (0.41) LMNAALDH1A1MAPT
SCHEMBL28038940 0.83 CCR2 (0.41) LMNAALDH1A1MAPT
SCHEMBL8628551 0.80 MMP1 (0.47) KMT2AGAALMNAALDH1A1POLB
SCHEMBL8628546 0.80 MMP1 (0.47) KMT2AGAALMNAALDH1A1POLB
SCHEMBL7792279 0.79 ALDH1A1 (0.35) KMT2AALDH1A1MEN1CYP1A2CYP3A4
SCHEMBL7792275 0.79 ALDH1A1 (0.35) KMT2AALDH1A1MEN1CYP1A2CYP3A4
SCHEMBL9550114 0.79 ALDH1A1 (0.35) KMT2AALDH1A1MEN1CYP1A2CYP3A4
SCHEMBL8089114 0.78 NPC1 (0.44) KMT2AGAALMNAALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6200480-B1 CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES ARCH SPECIALTY CHEMICALS, INC. 2001-03-13 US disclosed
EP-1054715-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS Olin Microelectronic Chemicals, Inc. (US) 2000-11-29 EP disclosed
WO-1999036151-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-07-22 WO disclosed
EP-0819982-A1 Radiation-sensitive composition Olin Microelectronic Chemicals, Inc. (US) 1998-01-21 EP disclosed