SCHEMBL7792964

SCHEMBL7792964

Cc1ccc(S(=O)(=O)[O-])cc1.OC1CC[S+](c2ccccc2)C1

nearest known ligand 0.38

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
GAA P10253 2/20 0.35
CYP3A4 P08684 2/20 0.35
CYP2D6 P10635 2/20 0.35
KDM4E B2RXH2 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2C9 P11712 1/20 0.35
HPGD P15428 1/20 0.35
ALOX12 P18054 1/20 0.35
CYP2C19 P33261 1/20 0.35
GFER P55789 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
NPSR1 Q6W5P4 2/20 0.35
ACHE P22303 1/20 0.35
CA12 O43570 2/20 0.34
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CA9 Q16790 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4401013 0.79 GAA (0.41) ALDH1A1MEN1KMT2AGAACYP3A4
SCHEMBL10418852 0.69 GAA (0.52) ALDH1A1MEN1KMT2AGAACYP3A4
Benzene SCHEMBL29261851 0.69 GAA (0.56) ALDH1A1GAACYP3A4CYP2D6KDM4E
SCHEMBL2900940 0.69 HTR6 (0.37) ALDH1A1MEN1KMT2AGAAKDM4E
SCHEMBL2900947 0.68 ACHE (0.39) ALDH1A1MEN1KMT2AGAAACHE
SCHEMBL11340004 0.67 NPSR1 (0.41) ALDH1A1GAACYP3A4CYP2D6KDM4E
SCHEMBL3833138 0.67 GAA (0.59) ALDH1A1GAACYP3A4CYP2D6KDM4E
Phenol SCHEMBL9390292 0.67 CA12 (0.46) ALDH1A1GAACYP3A4CYP2D6KDM4E
SCHEMBL52309 0.67 MMP2 (0.46) ALDH1A1MEN1KMT2AGAACYP3A4
Biphenyl SCHEMBL23364905 0.66 CA12 (0.49) ALDH1A1MEN1KMT2AGAACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed