Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | CA12 | O43570 | 4/20 | 0.46 |
| ▸ | CA9 | Q16790 | 4/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 4/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10492043 | 0.98 | MMP2 (0.45) | MMP2NPSR1CA12CA9CYP3A4 | |
| Toliodium SCHEMBL2895872 | 0.94 | MMP2 (0.45) | MMP2NPSR1CA12CA9CYP3A4 | |
| SCHEMBL11274295 | 0.90 | L3MBTL1 (0.41) | MMP2NPSR1CA12CA9CYP3A4 | |
| Toliodium SCHEMBL2895871 | 0.90 | GAA (0.50) | MMP2NPSR1CA12CA9CYP3A4 | |
| SCHEMBL454457 | 0.88 | HTR6 (0.44) | MMP2CA12CA9ATML3MBTL1 | |
| SCHEMBL11146478 | 0.87 | HTT (0.62) | MMP2CYP1A2L3MBTL1HTTSMN1; SMN2 | |
| SCHEMBL11002835 | 0.87 | MMP2 (0.38) | MMP2NPSR1CA12CA9CYP3A4 | |
| SCHEMBL760068 | 0.87 | LMNA (0.49) | NPSR1HTTSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL10492059 | 0.87 | MEN1 (0.41) | MMP2NPSR1CA12CA9CYP3A4 | |
| SCHEMBL5709615 | 0.86 | TDP1 (0.46) | NPSR1CA12CYP3A4CA2HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2609 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4469534-B1 | COMPOSITION AND METHOD FOR FORMING AN ELECTROCHROMIC LAYER | AMPERIAL TECH GMBH (DE) | 2026-03-04 | — | — | EP | claimed |
| US-20250189857-A1 | COMPOSITION AND METHOD FOR FORMING AN ELECTROCHROMIC LAYER | Amperial Technologies GmbH (DE) | 2025-06-12 | — | — | US | claimed |
| US-12232338-B2 | Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof | CORNING INCORPORATED (US) | 2025-02-18 | — | — | US | claimed |
| US-12187851-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2025-01-07 | — | — | US | claimed |
| CN-111045296-B | UV patternable polymer blend for organic thin film transistor | 康宁股份有限公司 | 2024-12-27 | — | — | CN | claimed |
| EP-4469534-A1 | COMPOSITION AND METHOD FOR FORMING AN ELECTROCHROMIC LAYER | Amperial Technologies GmbH (DE) | 2024-12-04 | — | — | EP | claimed |
| CN-118092074-B | Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-08-20 | — | — | CN | claimed |
| CN-118092074-A | Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-111138810-B | UV patternable polymer blend for organic thin film transistor | 康宁股份有限公司 | 2024-05-17 | — | — | CN | claimed |
| WO-2023143984-A1 | COMPOSITION AND METHOD FOR FORMING AN ELECTROCHROMIC LAYER | FRIEDRICH-ALEXANDER-UNIVERSITAET ERLANGEN-NUERNBERG (DE) | 2023-08-03 | — | — | WO | claimed |
| US-5206317-A | RESIST MATERIAL AND PROCESS FOR USE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-04-27 | — | — | US | claimed |
| EP-0524187-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS. | DU PONT (US) | 1993-01-27 | — | — | EP | claimed |
| EP-0524246-A1 | RESIST MATERIAL AND PROCESS FOR USE. | DU PONT (US) | 1993-01-27 | — | — | EP | claimed |
| EP-0524250-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-01-27 | — | — | EP | claimed |
| US-5120633-A | Polymers with acid-labile ester/ether pendant groups and acid-generating photoinitiators; positives; printed circuits; resolution | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-06-09 | — | — | US | claimed |
| US-5077174-A | Aqueous development, stripping | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-12-31 | — | — | US | claimed |
| WO-1991015809-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | claimed |
| WO-1991015810-A1 | RESIST MATERIAL AND PROCESS FOR USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | claimed |
| WO-1991015808-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | claimed |
| US-4758312-A | Adding colorless electrochemically active compound having positive reduction potential | NALCO CHEMICAL COMPANY (US) | 1988-07-19 | — | — | US | claimed |