Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.45 |
| ▸ | HPGD | P15428 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.43 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.42 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | MAOB | P27338 | 1/20 | 0.41 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | ESRRA | P11474 | 1/20 | 0.38 |
| ▸ | STS | P08842 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9351579 | 0.86 | SRD5A2 (0.50) | MAPTHPGDRAB9AMAPK1LMNA | |
| SCHEMBL11520748 | 0.85 | MAPT (0.45) | MAPTHPGDKMT2ARAB9AMAPK1 | |
| SCHEMBL9352510 | 0.81 | MAPK1 (0.41) | MAPTHPGDKMT2ARAB9AMAPK1 | |
| SCHEMBL9352485 | 0.81 | MAPK1 (0.41) | MAPTKMT2ARAB9AMAPK1LMNA | |
| SCHEMBL75713 | 0.81 | MAPK1 (0.62) | MAPTHPGDRAB9AMAPK1LMNA | |
| SCHEMBL9545770 | 0.81 | MAPK1 (0.43) | MAPTRAB9AMAPK1ALDH1A1TSHR | |
| SCHEMBL9355360 | 0.80 | MAPK1 (0.39) | MAPTKMT2ARAB9AMAPK1LMNA | |
| SCHEMBL781927 | 0.80 | MAPK1 (0.53) | MAPTHPGDKMT2ARAB9AMAPK1 | |
| SCHEMBL11517109 | 0.80 | ALDH1A1 (0.54) | MAPTHPGDKMT2ARAB9AMAPK1 | |
| SCHEMBL1980073 | 0.79 | KIF11 (0.43) | MAPTKMT2AMAPK1LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116874659-A | Low-temperature secondary photo-curing grafting oligomer and photosensitive resin composition containing same | 深圳市安云鑫新材料科技有限公司 | 2023-10-13 | — | — | CN | claimed |
| JP-3157364-A | — | — | None | — | — | JP | disclosed |
| US-20260044080-A1 | COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT | RESONAC CORPORATION (JP) | 2026-02-12 | — | — | US | disclosed |
| CN-119836443-A | Copolymer, photosensitive resin composition, resin cured film, and image display element | 株式会社力森诺科 | 2025-04-15 | — | — | CN | disclosed |
| WO-2024127714-A1 | ZINC COMPLEX | 日触テクノファインケミカル株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122200-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED RESIN FILM, AND IMAGE DISPLAY DEVICE | 株式会社レゾナック | 2024-06-13 | — | — | WO | disclosed |
| US-12006386-B2 | Alkali soluble, photo-curable and thermo-curable copolymer, and photosensitive resin composition, photosensitive resin film and color filter using the same | LG CHEM, LTD. (KR) | 2024-06-11 | — | — | US | disclosed |
| WO-2024116596-A1 | COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION | 株式会社レゾナック | 2024-06-06 | — | — | WO | disclosed |
| WO-2024090084-A1 | RESIN COMPOSITION AND COMPOSITE MATERIAL | 株式会社レゾナック | 2024-05-02 | — | — | WO | disclosed |
| WO-2024024195-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM AND IMAGE DISPLAY ELEMENT | 株式会社レゾナック | 2024-02-01 | — | — | WO | disclosed |
| US-20050261458-A1 | Polycarboxylic acid resin, polycarboxylic acid resin composition, and cured article obtained therefrom | SHOWA HIGHPOLYMER CO., LTD. (JP) | 2005-11-24 | — | — | US | disclosed |
| CN-1223576-C | Compound with (methyl) acrylyl radical and its preparation process | NIPPON CATALYTIC CHEM IND (JP) | 2005-10-19 | — | — | CN | disclosed |
| US-6906116-B2 | Unsaturated polyester compounds, resins curable with actinic energy ray, processes for the production thereof, and curable compositions | KANAGAWA UNIVERSITY (JP) | 2005-06-14 | — | — | US | disclosed |
| US-6887946-B2 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20030134926-A1 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| CN-1417196-A | Compound with (methyl) acrylyl radical and its preparation process | NIPPON CATALYTIC CHEM IND (JP) | 2003-05-14 | — | — | CN | disclosed |
| EP-1308434-A1 | (Meth)acryloyl group-containing compound and method for producing the same | Nippon Shokubai Co., Ltd. (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-5849857-A | Production method for photo-sensitive resin and liquid photo-sensitive resin composition | NIPPON SHOKUBAI CO., LTD. (JP) | 1998-12-15 | — | — | US | disclosed |
| EP-0728788-A1 | PROCESS FOR PRODUCING PHOTOSENSITIVE RESIN AND LIQUID PHOTOSENSITIVE RESIN COMPOSITION | NIPPON SHOKUBAI CO., LTD. (JP) | 1996-08-28 | — | — | EP | disclosed |
| JP-H03157364-A | DIALKYL PEROXIDE, PRODUCTION AND USE THEREOF | NIPPON OIL & FATS CO LTD | 1991-07-05 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260044080-A1 | COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT | KDM2B, KDM1A, KDM3A | MAPT 2575/4885HPGD 668/4885KMT2A 51/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.