Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL7796145

COc1cccc2c([S+]3CCCC3)cccc12.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.38

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Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ACHE P22303 9/20 0.38
KCNH2 Q12809 2/20 0.33
MEN1 O00255 1/20 0.33
ESR1 P03372 1/20 0.33
GAA P10253 1/20 0.33
KMT2A Q03164 1/20 0.33
ESR2 Q92731 1/20 0.33
ALDH1A1 P00352 1/20 0.32
EDNRA P25101 1/20 0.32
NPC1 O15118 1/20 0.32
CA2 P00918 1/20 0.32
HTR6 P50406 1/20 0.31
PLAU P00749 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL36502 0.92 ALDH1A1 (0.37) ACHEALDH1A1NPC1
Trifluoromethanesulfonic Acid SCHEMBL31168290 0.92 ALDH1A1 (0.37) ACHEALDH1A1NPC1
Trifluoromethanesulfonic Acid SCHEMBL6564009 0.89 KDM4E (0.36) ACHEKCNH2MEN1ESR1GAA
Trifluoromethanesulfonic Acid SCHEMBL6564934 0.87 ACHE (0.34) ACHEKCNH2MEN1ESR1GAA
Trifluoromethanesulfonic Acid SCHEMBL6564523 0.87 MEN1 (0.33) ACHEKCNH2MEN1ESR1GAA
Trifluoromethanesulfonic Acid SCHEMBL6563968 0.86 ALDH1A1 (0.39) ACHEKCNH2MEN1GAAKMT2A
Trifluoromethanesulfonic Acid SCHEMBL6566214 0.86 HSD17B10 (0.34) ACHEMEN1ESR1GAAKMT2A
SCHEMBL6564717 0.85 IDO1 (0.39) MEN1KMT2AALDH1A1CA2PLAU
Trifluoromethanesulfonic Acid SCHEMBL6566070 0.84 KMT2A (0.38) ACHEKCNH2MEN1KMT2A
Trifluoromethanesulfonic Acid SCHEMBL4307394 0.84 ALDH1A1 (0.32) ACHEALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed