Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6563968

CCOc1cccc2c([S+]3CCCC3)cccc12.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.39
LMNA P02545 3/20 0.39
HTT P42858 2/20 0.39
TSHR P16473 2/20 0.39
MCOLN3 Q8TDD5 1/20 0.39
KCNH2 Q12809 6/20 0.33
RXFP1 Q9HBX9 3/20 0.33
ACHE P22303 1/20 0.33
CYP2A6 P11509 1/20 0.33
NPSR1 Q6W5P4 3/20 0.33
HPGD P15428 3/20 0.33
RECQL P46063 1/20 0.33
KDM4E B2RXH2 1/20 0.33
GAA P10253 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
MAPT P10636 1/20 0.33
ALOX12 P18054 1/20 0.33
NTSR1 P30989 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL36662 0.93 TSHR (0.44) ALDH1A1LMNAHTTTSHRMCOLN3
Trifluoromethanesulfonic Acid SCHEMBL31168250 0.93 TSHR (0.44) ALDH1A1LMNAHTTTSHRMCOLN3
Trifluoromethanesulfonic Acid SCHEMBL6564421 0.91 KDM4E (0.32) ALDH1A1LMNAHTTTSHRMCOLN3
Trifluoromethanesulfonic Acid SCHEMBL6566070 0.91 KMT2A (0.38) TSHRKCNH2RXFP1ACHECYP2A6
Trifluoromethanesulfonic Acid SCHEMBL6564009 0.91 KDM4E (0.36) KCNH2ACHEHPGDKDM4EGAA
Trifluoromethanesulfonic Acid SCHEMBL6564934 0.88 ACHE (0.34) ALDH1A1HTTKCNH2RXFP1ACHE
Trifluoromethanesulfonic Acid SCHEMBL7796145 0.86 ACHE (0.38) ALDH1A1KCNH2ACHEGAAMEN1
Trifluoromethanesulfonic Acid SCHEMBL7793121 0.85 PLAU (0.38) LMNAHPGDSMN1; SMN2MAPT
Trifluoromethanesulfonic Acid SCHEMBL6566368 0.85 TYMS (0.38) ALDH1A1KCNH2ACHEKDM4EGAA
Trifluoromethanesulfonic Acid SCHEMBL31168292 0.84 LMNA (0.36) ALDH1A1LMNAHTTTSHRMCOLN3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed