Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.72 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.45 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | HTT | P42858 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | HSPA5 | P11021 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.44 |
| ▸ | USP2 | O75604 | 1/20 | 0.44 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.44 |
| ▸ | IDO1 | P14902 | 1/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29402131 | 0.88 | AMY1A (0.83) | AMY1ATRPA1ALOX15HIF1ALMNA | |
| SCHEMBL29621432 | 0.88 | AMY1A (0.83) | AMY1ATRPA1ALOX15HIF1ALMNA | |
| SCHEMBL50622 | 0.88 | AMY1A (0.83) | AMY1ATRPA1ALOX15HIF1ALMNA | |
| SCHEMBL686350 | 0.86 | AMY1A (0.69) | AMY1ATRPA1HIF1AHSPA5SMN1; SMN2 | |
| SCHEMBL30320324 | 0.86 | AMY1A (0.69) | AMY1ATRPA1HIF1AHSPA5SMN1; SMN2 | |
| Methyl Alcohol SCHEMBL3081581 | 0.86 | AMY1A (0.80) | AMY1ATRPA1ALOX15HIF1ALMNA | |
| SCHEMBL1345514 | 0.84 | AMY1A (1.00) | AMY1ATRPA1ALOX15HIF1ALMNA | |
| SCHEMBL1345563 | 0.84 | AMY1A (1.00) | AMY1ATRPA1ALOX15HIF1ALMNA | |
| SCHEMBL1345917 | 0.84 | AMY1A (1.00) | AMY1ATRPA1ALOX15HIF1ALMNA | |
| SCHEMBL18352 | 0.84 | AMY1A (1.00) | AMY1ATRPA1ALOX15HIF1ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117099045-A | Negative photosensitive resin composition, cured product, laminate, method for producing cured product, and semiconductor device | 富士胶片株式会社 | 2023-11-21 | — | — | CN | disclosed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| CN-107797384-B | Photosensitive resin, positive photoresist and application | 上海飞凯电子材料有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-105301899-B | Photosensitive resin composition for forming insulating film in organic E L display element | 东京应化工业株式会社 | 2020-08-07 | — | — | CN | disclosed |
| CN-107544209-A | Positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2018-01-05 | — | — | CN | disclosed |
| CN-106933034-A | Positive light anti-etching agent composition | 东京应化工业株式会社 | 2017-07-07 | — | — | CN | disclosed |
| CN-105301899-A | Photosensitive resin composite for forming insulating film in organic EL display element | TOKYO OHKA KOGYO CO LTD | 2016-02-03 | — | — | CN | disclosed |
| CN-100404573-C | Positive photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2008-07-23 | — | — | CN | disclosed |
| CN-1823107-A | positive photoresist and method of forming photoresist | TOKYO OHKA KOGYO CO LTD (JP) | 2006-08-23 | — | — | CN | disclosed |
| US-20010024762-A1 | Phenol novolak resin, production process thereof, and positive photoresist composition using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-09-27 | — | — | US | disclosed |
| EP-0477691-B1 | Positive-type photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1997-07-16 | — | — | EP | disclosed |
| US-5340686-A | Alkali soluble phenol novolak resin, 1,2-quinone diazide compound and low molecular weight novolak compound | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0477691-A2 | Positive-type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1992-04-01 | — | — | EP | disclosed |