SCHEMBL7799173

SCHEMBL7799173

Oc1ccc(C(c2ccc(O)cc2)(c2ccc(O)cc2)C2CCCCC2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.40
ESR1 P03372 7/20 0.39
ESR2 Q92731 6/20 0.39
CYP3A4 P08684 3/20 0.39
LMNA P02545 2/20 0.39
TYR P14679 2/20 0.39
HPGD P15428 2/20 0.39
HSD17B10 Q99714 2/20 0.39
AR P10275 1/20 0.39
TSHR P16473 1/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
HTR6 P50406 1/20 0.39
ESRRG P62508 1/20 0.39
SLC6A3 Q01959 1/20 0.39
MIF P14174 1/20 0.38
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
EPHX1 P07099 1/20 0.37
DEGS1 O15121 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12913094 0.92 KEAP1 (0.47) KMT2AESR1ESR2CYP3A4TSHR
SCHEMBL7808091 0.91 ESR1 (0.57) KMT2AESR1ESR2CYP3A4LMNA
SCHEMBL2776653 0.88 MMP3 (0.50) KMT2AESR1ESR2CYP3A4LMNA
SCHEMBL7876478 0.86 CALM1 (0.41) KMT2AESR1ESR2CYP3A4LMNA
SCHEMBL11039100 0.83 KMT2A (0.40) KMT2AESR1ESR2CYP3A4LMNA
SCHEMBL27998004 0.81 CYP19A1 (0.39) KMT2AESR1ESR2CYP3A4LMNA
SCHEMBL2500413 0.81 CYP19A1 (0.54) KMT2AESR1ESR2CYP3A4LMNA
SCHEMBL6314521 0.79 ESR1 (0.46) KMT2AESR1ESR2CYP3A4LMNA
SCHEMBL5469803 0.79 ESR1 (0.46) KMT2AESR1ESR2CYP3A4LMNA
SCHEMBL7808092 0.79 ESR1 (0.59) ESR1ESR2SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed