SCHEMBL7808091

SCHEMBL7808091

CC(C)(c1ccc(O)cc1)c1ccc(C(c2ccc(O)cc2)(c2ccc(O)cc2)C2CCCCC2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 7/20 0.57
ESR2 Q92731 6/20 0.57
CYP3A4 P08684 2/20 0.57
HPGD P15428 2/20 0.57
AR P10275 1/20 0.57
TSHR P16473 1/20 0.57
SLC6A2 P23975 1/20 0.57
SLC6A4 P31645 1/20 0.57
HTR6 P50406 1/20 0.57
ESRRG P62508 1/20 0.57
SLC6A3 Q01959 1/20 0.57
HSD17B10 Q99714 1/20 0.57
ALDH1A1 P00352 2/20 0.50
LMNA P02545 1/20 0.42
TYR P14679 1/20 0.42
SHBG P04278 1/20 0.36
RAB9A P51151 1/20 0.36
KMT2A Q03164 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7799173 0.91 KMT2A (0.40) ESR1ESR2CYP3A4HPGDAR
SCHEMBL12913094 0.84 KEAP1 (0.47) ESR1ESR2CYP3A4TSHRALDH1A1
Bisphenol A SCHEMBL28240245 0.82 ESR1 (0.84) ESR1ESR2CYP3A4HPGDAR
SCHEMBL5469803 0.79 ESR1 (0.46) ESR1ESR2CYP3A4HPGDAR
SCHEMBL6314521 0.79 ESR1 (0.46) ESR1ESR2CYP3A4HPGDAR
SCHEMBL2776653 0.79 MMP3 (0.50) ESR1ESR2CYP3A4ALDH1A1LMNA
SCHEMBL7876478 0.78 CALM1 (0.41) ESR1ESR2CYP3A4SLC6A2SLC6A4
SCHEMBL5461605 0.77 ESR2 (0.48) ESR1ESR2CYP3A4HPGDAR
Bisphenol A SCHEMBL15062 0.76 ESR1 (1.00) ESR1ESR2CYP3A4HPGDAR
SCHEMBL27996 0.76 ESR1 (1.00) ESR1ESR2CYP3A4HPGDAR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed