SCHEMBL7804653

SCHEMBL7804653

CCCC(c1ccccc1O)(c1ccccc1O)c1ccccc1CCCc1ccccc1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR1A P08908 1/20 0.44
MPO P05164 4/20 0.41
SLC6A4 P31645 2/20 0.41
TAAR1 Q96RJ0 1/20 0.40
TSHR P16473 2/20 0.38
ALDH1A1 P00352 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
MGLL Q99685 1/20 0.38
IAPP P10997 1/20 0.37
BID P55957 3/20 0.36
MCL1 Q07820 3/20 0.36
BCL2L1 Q07817 2/20 0.36
BAK1 Q16611 2/20 0.36
KAT8 Q9H7Z6 2/20 0.36
PPARG P37231 1/20 0.36
PPARA Q07869 1/20 0.36
EP300 Q09472 1/20 0.36
KAT2A Q92830 1/20 0.36
KAT2B Q92831 1/20 0.36
KAT5 Q92993 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7876494 0.88 MPO (0.42) HTR1AMPOSLC6A4TAAR1TSHR
SCHEMBL5831906 0.83 TSHR (0.52) HTR1ATSHRALDH1A1TDP1HSPA5
SCHEMBL7809714 0.78 TSHR (0.47) HTR1AMPOSLC6A4TAAR1TSHR
SCHEMBL7876813 0.76 MPO (0.44) HTR1AMPOSLC6A4TAAR1TSHR
SCHEMBL18076593 0.76 ALDH1A1 (0.44) TSHRALDH1A1TDP1
SCHEMBL6706198 0.75 TSHR (0.58) HTR1AMPOSLC6A4TAAR1TSHR
Ethyne SCHEMBL4194758 0.75 HTR1A (0.56) HTR1AMPOSLC6A4TAAR1TSHR
SCHEMBL20232 0.74 HTR1A (0.60) HTR1AMPOSLC6A4TAAR1TSHR
SCHEMBL29450060 0.74 HTR1A (0.60) HTR1AMPOSLC6A4TAAR1TSHR
SCHEMBL9319489 0.74 HTR1A (0.60) HTR1AMPOSLC6A4TAAR1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed