SCHEMBL7804684

SCHEMBL7804684

Cc1cc(-c2ccc(O)c(C3CCCCC3)c2)ccc1C(c1ccc(-c2ccc(O)c(C3CCCCC3)c2)cc1C)c1ccccc1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NUDT1 P36639 1/20 0.39
BACE1 P56817 1/20 0.39
HSP90AA1 P07900 1/20 0.39
SLC6A9 P48067 1/20 0.33
HSD17B1 P14061 2/20 0.33
HSD17B2 P37059 2/20 0.33
PTGS2 P35354 1/20 0.32
THRB P10828 3/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
THRA P10827 2/20 0.32
MAPT P10636 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
ESR2 Q92731 1/20 0.31
CAMKK2 Q96RR4 2/20 0.31
CAMKK1 Q8N5S9 1/20 0.31
GABRA1 P14867 1/20 0.31
GABRB2 P47870 1/20 0.31
HDAC4 P56524 1/20 0.31
HDAC2 Q92769 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7804682 0.83 NUDT1 (0.37) NUDT1BACE1HSP90AA1PTGS2MEN1
SCHEMBL30127784 0.83 NUDT1 (0.37) NUDT1BACE1HSP90AA1MEN1KMT2A
SCHEMBL757158 0.83 NUDT1 (0.37) NUDT1BACE1HSP90AA1MEN1KMT2A
SCHEMBL29375612 0.83 NUDT1 (0.37) NUDT1BACE1HSP90AA1MEN1KMT2A
Orthocresol SCHEMBL15512018 0.82 NUDT1 (0.46) NUDT1BACE1HSP90AA1SLC6A9HSD17B1
SCHEMBL30899209 0.79 NUDT1 (0.46) NUDT1BACE1HSP90AA1THRBMEN1
SCHEMBL761684 0.79 NUDT1 (0.46) NUDT1BACE1HSP90AA1THRBMEN1
SCHEMBL29375864 0.79 NUDT1 (0.46) NUDT1BACE1HSP90AA1THRBMEN1
SCHEMBL29484425 0.78 GABRA1 (0.35) NUDT1BACE1HSP90AA1THRBMEN1
SCHEMBL760343 0.78 GABRA1 (0.35) NUDT1BACE1HSP90AA1THRBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed