SCHEMBL7805697

SCHEMBL7805697

Cc1cc(O)ccc1C(c1ccc(O)c(O)c1)c1ccc(O)cc1C

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 6/20 0.41
RECQL P46063 5/20 0.41
KDM4E B2RXH2 5/20 0.41
MAPT P10636 5/20 0.41
HIF1A Q16665 3/20 0.41
HSD17B10 Q99714 3/20 0.41
KMT2A Q03164 3/20 0.41
LMNA P02545 2/20 0.41
TSHR P16473 2/20 0.41
APEX1 P27695 2/20 0.41
MTOR P42345 2/20 0.41
ALOX15 P16050 1/20 0.41
NFKB1 P19838 1/20 0.41
THPO P40225 1/20 0.41
POLB P06746 1/20 0.41
BLM P54132 1/20 0.41
TRPA1 O75762 1/20 0.40
PTGS1 P23219 1/20 0.40
CACNA1C Q13936 1/20 0.40
ESR1 P03372 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20808747 0.87 ESR2 (0.42) ALOX15TRPA1PTGS1CACNA1CESR1
SCHEMBL5958727 0.87 ESR2 (0.45) ALOX15TRPA1PTGS1CACNA1CESR1
SCHEMBL7809665 0.85 ESR1 (0.47) TDP1MAPTKMT2ALMNAALOX15
SCHEMBL32675854 0.85 ESR1 (0.47) TDP1MAPTKMT2ALMNAALOX15
SCHEMBL2871001 0.81 ACHE (0.44) LMNAALOX15TRPA1ESR1ESR2
SCHEMBL2501926 0.80 ESR2 (0.49) RECQLTSHRALOX15ESR1ESR2
SCHEMBL29465793 0.80 ESR2 (0.49) RECQLTSHRALOX15ESR1ESR2
SCHEMBL36188 0.80 TRPA1 (0.46) TDP1RECQLKDM4EMAPTHIF1A
SCHEMBL7806619 0.80 ADRB1 (0.44) KDM4EHIF1AHSD17B10LMNATSHR
SCHEMBL29373437 0.80 TRPA1 (0.46) TDP1RECQLKDM4EMAPTHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed