SCHEMBL7808185

SCHEMBL7808185

CC(C)(C)c1cc(C(c2ccc(O)cc2)c2ccc(O)c(C(C)(C)C)c2)ccc1O

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.62
ALOX15 P16050 4/20 0.62
LMNA P02545 3/20 0.62
TYR P14679 2/20 0.62
CYP2C9 P11712 2/20 0.62
HSD17B10 Q99714 2/20 0.62
NR1I2 O75469 1/20 0.62
MIF P14174 1/20 0.62
HTT P42858 1/20 0.62
NFE2L2 Q16236 1/20 0.62
CYP1A2 P05177 2/20 0.45
MAPT P10636 2/20 0.45
KDM4E B2RXH2 1/20 0.45
ATP2A2 P16615 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
ATP2A3 Q93084 1/20 0.45
GAA P10253 1/20 0.43
TDP1 Q9NUW8 3/20 0.41
TSHR P16473 1/20 0.41
ESR1 P03372 5/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1596482 0.94 ALDH1A1 (0.57) ALDH1A1ALOX15LMNATYRCYP2C9
SCHEMBL7922321 0.87 ALDH1A1 (0.50) ALDH1A1ALOX15LMNATYRCYP2C9
SCHEMBL7799222 0.87 ALDH1A1 (0.53) ALDH1A1ALOX15LMNATYRCYP2C9
SCHEMBL7808158 0.84 ALDH1A1 (0.56) ALDH1A1ALOX15LMNATYRCYP2C9
SCHEMBL3285515 0.84 ALDH1A1 (0.60) ALDH1A1ALOX15LMNATYRCYP2C9
SCHEMBL30343447 0.80 ALDH1A1 (0.59) ALDH1A1ALOX15LMNATYRCYP2C9
SCHEMBL1597576 0.80 ALDH1A1 (0.59) ALDH1A1ALOX15LMNATYRCYP2C9
E319 SCHEMBL10625736 0.80 ALDH1A1 (0.95) ALDH1A1ALOX15LMNATYRCYP2C9
SCHEMBL3284702 0.80 CYP2C9 (0.55) ALDH1A1ALOX15LMNATYRCYP2C9
SCHEMBL31388034 0.79 ALDH1A1 (0.57) ALDH1A1ALOX15LMNATYRCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed