SCHEMBL7799222

SCHEMBL7799222

CC(C)(C)c1cc(C(c2ccc(O)c(O)c2)c2ccc(O)c(C(C)(C)C)c2)ccc1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.53
ALOX15 P16050 4/20 0.53
HSD17B10 Q99714 4/20 0.53
LMNA P02545 4/20 0.53
NR1I2 O75469 1/20 0.53
CYP2C9 P11712 1/20 0.53
MIF P14174 1/20 0.53
TYR P14679 1/20 0.53
HTT P42858 1/20 0.53
NFE2L2 Q16236 1/20 0.53
MAPT P10636 7/20 0.46
KDM4E B2RXH2 6/20 0.46
CYP1A2 P05177 2/20 0.46
ATP2A2 P16615 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
ATP2A3 Q93084 1/20 0.46
TDP1 Q9NUW8 9/20 0.45
HPGD P15428 2/20 0.45
RECQL P46063 6/20 0.43
KMT2A Q03164 4/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1596482 0.92 ALDH1A1 (0.57) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL7808185 0.87 ALDH1A1 (0.62) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL7922321 0.85 ALDH1A1 (0.50) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL11588725 0.82 ALDH1A1 (0.55) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL7808158 0.82 ALDH1A1 (0.56) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL30343447 0.82 ALDH1A1 (0.59) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL1597576 0.82 ALDH1A1 (0.59) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL109026 0.81 TDP1 (0.54) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL31516962 0.81 TDP1 (0.54) ALDH1A1ALOX15HSD17B10LMNANR1I2
SCHEMBL3287976 0.80 ALDH1A1 (0.57) ALDH1A1ALOX15HSD17B10LMNANR1I2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed