SCHEMBL7808158

SCHEMBL7808158

CC(C)(C)c1cc(C(c2cccc(O)c2)c2ccc(O)c(C(C)(C)C)c2)ccc1O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.56
LMNA P02545 4/20 0.56
MIF P14174 2/20 0.56
ALOX15 P16050 2/20 0.56
HSD17B10 Q99714 2/20 0.56
NR1I2 O75469 1/20 0.56
CYP2C9 P11712 1/20 0.56
TYR P14679 1/20 0.56
HTT P42858 1/20 0.56
NFE2L2 Q16236 1/20 0.56
TSHR P16473 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
ADRB1 P08588 2/20 0.41
ADRA1A P35348 2/20 0.41
HTR2A P28223 1/20 0.41
HTR2B P41595 1/20 0.41
KDM4E B2RXH2 2/20 0.41
CYP1A2 P05177 1/20 0.41
MAPT P10636 1/20 0.41
ATP2A2 P16615 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7922321 0.86 ALDH1A1 (0.50) ALDH1A1LMNAMIFALOX15HSD17B10
SCHEMBL1596482 0.86 ALDH1A1 (0.57) ALDH1A1LMNAMIFALOX15HSD17B10
SCHEMBL7808185 0.84 ALDH1A1 (0.62) ALDH1A1LMNAMIFALOX15HSD17B10
SCHEMBL7799222 0.82 ALDH1A1 (0.53) ALDH1A1LMNAMIFALOX15HSD17B10
SCHEMBL1758130 0.78 LMNA (0.52) ALDH1A1LMNAMIFHSD17B10CYP2C9
SCHEMBL9616897 0.78 LMNA (0.58) ALDH1A1LMNAMIFHSD17B10CYP2C9
SCHEMBL2408575 0.77 HSD17B1 (0.53) ALDH1A1LMNAMIFTSHRTDP1
SCHEMBL7804646 0.77 ALDH1A1 (0.50) ALDH1A1LMNAMIFALOX15HSD17B10
SCHEMBL1597576 0.76 ALDH1A1 (0.59) ALDH1A1LMNAMIFALOX15HSD17B10
SCHEMBL30343447 0.76 ALDH1A1 (0.59) ALDH1A1LMNAMIFALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed