SCHEMBL7809658

SCHEMBL7809658

OC(CCc1ccccc1CCC(O)c1ccccc1)c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 1/20 0.53
LMNA P02545 1/20 0.52
KDM4E B2RXH2 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
AOC3 Q16853 5/20 0.47
PPARG P37231 1/20 0.46
PPARA Q07869 1/20 0.46
DHFR P00374 1/20 0.43
HTR1A P08908 1/20 0.41
BCAT2 O15382 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2592053 0.90 LMNA (0.53) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL31005082 0.88 TAAR1 (0.48) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL11050916 0.88 TAAR1 (0.48) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL31005083 0.88 TAAR1 (0.48) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL477470 0.86 PPARG (0.54) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL499868 0.86 PPARG (0.54) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL5835025 0.86 PPARG (0.54) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL936320 0.86 PPARG (0.58) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL30849666 0.86 TAAR1 (0.48) RIPK1LMNAKDM4EL3MBTL1AOC3
SCHEMBL30849682 0.86 SLC6A2 (0.53) RIPK1LMNAKDM4EL3MBTL1AOC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed
EP-0485472-A1 BIS-CYCLIC PHOSPHITE COMPOUNDS AND POLYMERIC MATERIALS STABILIZED THEREWITH EASTMAN KODAK COMPANY (US) 1992-05-20 EP disclosed
EP-0437493-A1 CYCLIC PHOSPHITES AND STABILIZED POLYMERIC COMPOSITIONS EASTMAN KODAK COMPANY (US) 1991-07-24 EP disclosed
WO-1991001987-A1 BIS-CYCLIC PHOSPHITE COMPOUNDS AND POLYMERIC MATERIALS STABILIZED THEREWITH EASTMAN KODAK COMPANY (US) 1991-02-21 WO disclosed
EP-0412028-A1 Bis-cyclic phosphite compounds and polymeric materials stabilized therewith EASTMAN KODAK COMPANY (US) 1991-02-06 EP disclosed
US-4956406-A Oxidation resistance of polypropylene or copolymers also heat resistance and radiation resistance EASTMAN KODAK COMPANY (US) 1990-09-11 US disclosed
US-4929654-A HEAT RESISTANCE, LIGHT RESISTANCE EASTMAN KODAK COMPANY (US) 1990-05-29 US disclosed
WO-1990003976-A1 CYCLIC PHOSPHITES AND STABILIZED POLYMERIC COMPOSITIONS EASTMAN KODAK COMPANY (US) 1990-04-19 WO disclosed
EP-0363270-A1 Cyclic phosphites and stabilized polymeric compositions EASTMAN KODAK COMPANY (US) 1990-04-11 EP disclosed