Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | KCNA1 | Q09470 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propane SCHEMBL11764249 | 1.00 | TSHR (0.38) | TSHRALDH1A1LMNATHRBNFKB1 | |
| Propane SCHEMBL8444696 | 1.00 | — | — | |
| Propane SCHEMBL27735195 | 1.00 | — | — | |
| Propane SCHEMBL28758767 | 1.00 | — | — | |
| Propane SCHEMBL28670151 | 1.00 | — | — | |
| Propane SCHEMBL7997861 | 1.00 | TSHR (0.38) | TSHRALDH1A1LMNATHRBNFKB1 | |
| Propane SCHEMBL7708559 | 1.00 | — | — | |
| Propane SCHEMBL787112 | 1.00 | TSHR (0.38) | TSHRALDH1A1LMNATHRBNFKB1 | |
| Propane SCHEMBL27793722 | 0.91 | — | — | |
| Propane SCHEMBL27383303 | 0.91 | ALDH1A1 (0.33) | TSHRALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11830741-B2 | Method for forming film | TOKYO ELECTRON LIMITED (JP) | 2023-11-28 | — | — | US | claimed |
| US-20220189778-A1 | METHOD FOR FORMING FILM | TOKYO ELECTRON LIMITED (JP) | 2022-06-16 | — | — | US | claimed |
| US-11219598-B2 | Ophthalmic drug sustained release device | PUBLIC UNIVERSITY CORPORATION NAGOYA CITY UNIVERSITY (JP) | 2022-01-11 | — | — | US | claimed |
| US-10692729-B2 | Etching process method | TOKYO ELECTRON LIMITED (JP) | 2020-06-23 | — | — | US | claimed |
| US-20190099366-A1 | OPHTHALMIC DRUG SUSTAINED RELEASE DEVICE | YASUKAWA, TSUTOMU (JP) | 2019-04-04 | — | — | US | claimed |
| EP-3453366-A1 | OPHTHALMIC DRUG SUSTAINED RELEASE DEVICE | Public University Corporation Nagoya City University (JP) | 2019-03-13 | — | — | EP | claimed |
| US-20170372916-A1 | ETCHING PROCESS METHOD | TOKYO ELECTRON LIMITED (JP) | 2017-12-28 | — | — | US | claimed |
| US-8039204-B2 | Manufacturing method of silicon carbide semiconductor apparatus | MITSUBISHI ELECTRIC CORPORATION (JP) | 2011-10-18 | — | — | US | claimed |
| US-6869732-B2 | Glass substrate for photomasks and preparation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | claimed |
| US-6855908-B2 | Glass substrate and leveling thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-02-15 | — | — | US | claimed |
| US-12592367-B2 | Plasma processing apparatus and manufacturing method of wafer stage for plasma processing apparatus | HITACHI HIGH-TECH CORPORATION (JP) | 2026-03-31 | — | — | US | disclosed |
| US-12537175-B2 | Semiconductor device manufacturing system and semiconductor device manufacturing method | HITACHI HIGH-TECH CORPORATION (JP) | 2026-01-27 | — | — | US | disclosed |
| US-20260011538-A1 | SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | HITACHI HIGH TECH COPORATION (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4241799-B1 | METAL MATERIAL FOR MEDICAL DEVICE, MANUFACTURING METHOD FOR METAL MATERIAL FOR MEDICAL DEVICE, AND MEDICAL DEVICE | GLOBAL VASCULAR CO LTD (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-20250218790-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Kokusai Electric Corporation (JP) | 2025-07-03 | — | — | US | disclosed |
| US-5536298-A | Method of treating fine particle dust in manufacturing process of semiconductor elements and apparatus therefor | AWAJI TOSHIO (JP) | 1996-07-16 | — | — | US | disclosed |
| US-5514205-A | Apparatus for removing harmful objects from a gas | AWAJI TOSHIO (JP) | 1996-05-07 | — | — | US | disclosed |
| US-4680045-A | OPTICAL FIBERS | SEIKO EPSON KABUSHIKI KAISHA (JP) | 1987-07-14 | — | — | US | disclosed |
| US-4680048-A | OPTICAL FIBERS | SEIKO EPSON KABUSHIKI KAISHA (JP) | 1987-07-14 | — | — | US | disclosed |
| US-4680046-A | DOPED SILICA GLASS | SEIKO EPSON KABUSHIKI KAISHA (JP) | 1987-07-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12592367-B2 | Plasma processing apparatus and manufacturing method of wafer stage for plasma processing apparatus | C9, PRF1, LNPK | TSHR 3390/4885ALDH1A1 2890/4885LMNA 533/4885 |
| US-20260011538-A1 | SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | ESPL1, PIEZO1, EXOSC4 | TSHR 2958/4885ALDH1A1 4435/4885LMNA 3964/4885 |
| US-12537175-B2 | Semiconductor device manufacturing system and semiconductor device manufacturing method | SEM1, ESPL1, PIEZO1 | TSHR 1385/4885ALDH1A1 2631/4885LMNA 4400/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.