Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 2/20 | 0.39 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.31 |
| ▸ | ADRA2C | P18825 | 3/20 | 0.31 |
| ▸ | ADRA2B | P18089 | 2/20 | 0.31 |
| ▸ | HTR1A | P08908 | 2/20 | 0.31 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.31 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.30 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.30 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.30 |
| ▸ | BDKRB2 | P30411 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8659100 | 0.81 | GABRA1 (0.39) | GABRA1GABRB2ALDH1A1TSHRKDM4E | |
| SCHEMBL792521 | 0.78 | GABRA1 (0.39) | GABRA1GABRB2ALDH1A1TSHRKDM4E | |
| SCHEMBL28899369 | 0.78 | GABRA1 (0.43) | GABRA1GABRB2ALDH1A1TSHRHTT | |
| SCHEMBL14472081 | 0.78 | GABRA1 (0.39) | GABRA1GABRB2ALDH1A1TSHRKDM4E | |
| SCHEMBL144630 | 0.78 | GABRA1 (0.39) | GABRA1GABRB2ALDH1A1TSHRKDM4E | |
| Water SCHEMBL2836979 | 0.76 | GABRA1 (0.38) | GABRA1GABRB2ALDH1A1TSHRKDM4E | |
| Hydrochloric Acid SCHEMBL668040 | 0.76 | GABRA1 (0.38) | GABRA1GABRB2ALDH1A1TSHRKDM4E | |
| Bromide SCHEMBL4908296 | 0.76 | GABRA1 (0.38) | GABRA1GABRB2ALDH1A1TSHRKDM4E | |
| SCHEMBL11056233 | 0.75 | GABRA1 (0.41) | GABRA1GABRB2ALDH1A1TSHRHTT | |
| SCHEMBL8522980 | 0.75 | GABRA1 (0.42) | GABRA1GABRB2ALDH1A1KDM4EAKR1B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11884839-B2 | Acetal-protected silanol group-containing polysiloxane composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-30 | — | — | US | disclosed |
| US-10845703-B2 | Film-forming composition containing silicone having crosslinking reactivity | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-11-24 | — | — | US | disclosed |
| US-10838303-B2 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-11-17 | — | — | US | disclosed |
| US-10613440-B2 | Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-04-07 | — | — | US | disclosed |
| US-10372040-B2 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-08-06 | — | — | US | disclosed |
| US-10372039-B2 | Resist underlayer film forming composition containing silicon having ester group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-08-06 | — | — | US | disclosed |
| US-20190185707-A1 | ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2019-06-20 | — | — | US | disclosed |
| US-10139729-B2 | Coating composition for pattern reversal on soc pattern | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-11-27 | — | — | US | disclosed |
| US-20180335698-A1 | FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING REACTIVITY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-11-22 | — | — | US | disclosed |
| US-20180239250-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING HYDROLYZABLE SILANE HAVING CARBONATE SKELETON | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-23 | — | — | US | disclosed |
| US-9023588-B2 | Resist underlayer film forming composition containing silicon having nitrogen-containing ring | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20150118396-A1 | UNDERLAYER FILM-FORMING COMPOSITION FOR SELF-ASSEMBLED FILMS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-04-30 | — | — | US | disclosed |
| EP-2832807-A1 | UNDERLAYER FILM FORMING COMPOSITION FOR SELF-ASSEMBLED FILMS | Nissan Chemical Industries, Ltd. (JP) | 2015-02-04 | — | — | EP | disclosed |
| US-20140377957-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION FOR SOLVENT DEVELOPMENT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-25 | — | — | US | disclosed |
| US-20140170855-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING SULFONE STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-06-19 | — | — | US | disclosed |
| EP-2735904-A1 | THIN FILM FORMATION COMPOSITION FOR LITHOGRAPHY WHICH CONTAINS TITANIUM AND SILICON | Nissan Chemical Industries, Ltd. (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140120730-A1 | THIN FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING TITANIUM AND SILICON | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-01 | — | — | US | disclosed |
| EP-2538276-A1 | COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM CONTAINING SILICON HAVING NITROGEN-CONTAINING RING | Nissan Chemical Industries, Ltd. (JP) | 2012-12-26 | — | — | EP | disclosed |
| US-20120315765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-12-13 | — | — | US | disclosed |
| US-20120070994-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120315765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING | SRSF1, SRSF7, SRRM2 | GABRA1 4445/4885GABRB2 3844/4885ALDH1A1 2272/4885 |
| US-20120070994-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND | SMC3, SRSF3, SRSF9 | GABRA1 3568/4885GABRB2 3428/4885ALDH1A1 3278/4885 |
| US-10845703-B2 | Film-forming composition containing silicone having crosslinking reactivity | SETDB1, KDM2B, SRSF9 | GABRA1 4090/4885GABRB2 3316/4885ALDH1A1 1744/4885 |
| US-20180335698-A1 | FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING REACTIVITY | SETDB1, KDM2B, CD79B | GABRA1 4184/4885GABRB2 3272/4885ALDH1A1 1860/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.