⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7908211 | 0.82 | — | — | |
| SCHEMBL9171301 | 0.80 | ALDH1A1 (0.38) | — | |
| SCHEMBL16027145 | 0.79 | — | — | |
| SCHEMBL6293725 | 0.79 | — | — | |
| SCHEMBL723355 | 0.76 | — | — | |
| SCHEMBL6035054 | 0.73 | ALOX15 (0.34) | — | |
| SCHEMBL2875196 | 0.70 | LMNA (0.35) | — | |
| SCHEMBL2875198 | 0.70 | LMNA (0.35) | — | |
| SCHEMBL7691642 | 0.69 | ALDH1A1 (0.41) | — | |
| SCHEMBL11061361 | 0.68 | ALDH1A1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0404446-B1 | A method of forming photoresists by polymerisation of di-unsaturated monomers | LOCTITE IRELAND LTD (IE) | 1995-04-26 | — | — | EP | claimed |
| US-6201088-B1 | CONTAINING 2-CYANOPENTADIENOIC ACID ALKYL ESTER AND ALKYLENE-BIS-(2-CYANOPENTADIENOATE); BONDING ELECTRONICS; HEAT RESISTANCE, STORAGE STABILITY AND ACCEPTABLE CURE TIMES | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2001-03-13 | — | — | US | disclosed |
| EP-0929617-A1 | CYANOACRYLATE ADHESIVE | Henkel Kommanditgesellschaft auf Aktien (DE) | 1999-07-21 | — | — | EP | disclosed |
| WO-1998014526-A1 | CYANOACRYLATE ADHESIVE | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 1998-04-09 | — | — | WO | disclosed |
| EP-0404446-B1 | A method of forming photoresists by polymerisation of di-unsaturated monomers | LOCTITE IRELAND LTD (IE) | 1995-04-26 | — | — | EP | disclosed |
| US-5187048-A | Applying polymer substrate, imagewise exposing coating to high energy radiation, solvent development | LOCTITE (IRELAND) LIMITED (IE) | 1993-02-16 | — | — | US | disclosed |
| EP-0404446-A2 | A method of forming photoresists by polymerisation of di-unsaturated monomers | LOCTITE (IRELAND) Ltd. (IE) | 1990-12-27 | — | — | EP | disclosed |