SCHEMBL7912164

SCHEMBL7912164

Clc1ccccc1-c1nc(-c2ccccc2)c(-c2ccccc2)n1C1(c2ccccc2Cl)NC(c2ccccc2)=C(c2ccccc2)N1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.36
AKT1 P31749 2/20 0.35
AKT2 P31751 2/20 0.35
MAPK13 O15264 1/20 0.34
RAF1 P04049 1/20 0.34
MAPK12 P53778 1/20 0.34
MAPK11 Q15759 1/20 0.34
MAPK14 Q16539 1/20 0.34
HPGD P15428 2/20 0.33
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
LMNA P02545 2/20 0.33
TP53 P04637 1/20 0.33
CYP1A2 P05177 1/20 0.33
ALPL P05186 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29749791 0.78 HSD11B1 (0.37) HSD11B1AKT1AKT2MAPK13RAF1
SCHEMBL29359500 0.78 HSD11B1 (0.37) HSD11B1AKT1AKT2MAPK13RAF1
SCHEMBL307038 0.78 HSD11B1 (0.37) HSD11B1AKT1AKT2MAPK13RAF1
SCHEMBL7918453 0.76 AKT1 (0.39) AKT1AKT2MAPK14HPGDNPC1
SCHEMBL7915134 0.76 L3MBTL1 (0.41) HPGDNPC1RAB9ASMN1; SMN2TP53
SCHEMBL13645037 0.74 HSD11B1 (0.37) HSD11B1AKT1AKT2HPGDNPC1
SCHEMBL16857695 0.74 AKT1 (0.34) HSD11B1AKT1AKT2MAPK13RAF1
SCHEMBL13707049 0.73 HSD11B1 (0.38) HSD11B1AKT1AKT2HPGDSMN1; SMN2
SCHEMBL22504442 0.73 AKT1 (0.33) HSD11B1AKT1AKT2MAPK13RAF1
SCHEMBL29732755 0.72 HSD11B1 (0.49) HSD11B1MAPK13RAF1MAPK12MAPK11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180323-B1 PREPARING PHOTOPOLYMERIZABLE ELEMENT COMPRISING SUPPORT AND PHOTOPOLYMERIZABLE FORMULATION; APPLYING TO COPPER CLAD SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION; DEVELOPING TO FORM RESIST IMAGE ON COPPER CLAD SUBSTRATE E. I. DU PONT DE NEMOURS AND COMPANY 2001-01-30 US disclosed
EP-1062546-A1 PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES E.I. DUPONT DE NEMOURS AND COMPANY (US) 2000-12-27 EP disclosed
WO-1999046644-A1 PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-09-16 WO disclosed