SCHEMBL7915134

SCHEMBL7915134

COc1ccc(C2=C(c3ccccc3Cl)NC(c3ccccc3Cl)(n3c(-c4ccccc4Cl)nc(-c4ccccc4Cl)c3-c3ccc(OC)c(OC)c3)N2)cc1OC

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.41
TP53 P04637 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
ALDH1A1 P00352 2/20 0.41
NPC1 O15118 1/20 0.41
TSHR P16473 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
PDE4A P27815 5/20 0.39
PIK3CD O00329 1/20 0.35
MAPT P10636 1/20 0.35
PDGFRB P09619 1/20 0.34
PDE10A Q9Y233 1/20 0.34
HTR7 P34969 1/20 0.33
KDM4E B2RXH2 1/20 0.33
HPGD P15428 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16365751 0.80 L3MBTL1 (0.43) L3MBTL1TP53MEN1KMT2AALDH1A1
SCHEMBL29895740 0.80 L3MBTL1 (0.43) L3MBTL1TP53MEN1KMT2AALDH1A1
SCHEMBL16355181 0.80 L3MBTL1 (0.43) L3MBTL1TP53MEN1KMT2AALDH1A1
SCHEMBL31734215 0.80 L3MBTL1 (0.43) L3MBTL1TP53MEN1KMT2AALDH1A1
SCHEMBL16355182 0.78 L3MBTL1 (0.41) L3MBTL1TP53MEN1KMT2AALDH1A1
SCHEMBL7044209 0.77 NPC1 (0.54) L3MBTL1TP53MEN1KMT2AALDH1A1
SCHEMBL7912164 0.76 HSD11B1 (0.36) TP53ALDH1A1NPC1RAB9ASMN1; SMN2
SCHEMBL20464140 0.74 L3MBTL1 (0.44) L3MBTL1TP53MEN1KMT2AALDH1A1
SCHEMBL22710269 0.74 L3MBTL1 (0.43) L3MBTL1TP53MEN1KMT2AALDH1A1
SCHEMBL29895743 0.74 L3MBTL1 (0.43) L3MBTL1TP53MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180323-B1 PREPARING PHOTOPOLYMERIZABLE ELEMENT COMPRISING SUPPORT AND PHOTOPOLYMERIZABLE FORMULATION; APPLYING TO COPPER CLAD SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION; DEVELOPING TO FORM RESIST IMAGE ON COPPER CLAD SUBSTRATE E. I. DU PONT DE NEMOURS AND COMPANY 2001-01-30 US disclosed