Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.37 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 3/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | AKT1 | P31749 | 2/20 | 0.33 |
| ▸ | AKT2 | P31751 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | BCHE | P06276 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | DPP4 | P27487 | 1/20 | 0.33 |
| ▸ | MAPK13 | O15264 | 1/20 | 0.33 |
| ▸ | RAF1 | P04049 | 1/20 | 0.33 |
| ▸ | MAPK12 | P53778 | 1/20 | 0.33 |
| ▸ | MAPK11 | Q15759 | 1/20 | 0.33 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29359500 | 1.00 | HSD11B1 (0.37) | HSD11B1CYP2A6LMNAKDM4EAKT1 | |
| SCHEMBL29749791 | 1.00 | HSD11B1 (0.37) | HSD11B1CYP2A6LMNAKDM4EAKT1 | |
| SCHEMBL13645037 | 0.93 | HSD11B1 (0.37) | HSD11B1CYP2A6LMNAKDM4EAKT1 | |
| SCHEMBL3094986 | 0.92 | L3MBTL1 (0.39) | HSD11B1LMNAKDM4EKMT2AHPGD | |
| SCHEMBL15926080 | 0.92 | AKT1 (0.34) | HSD11B1KDM4EAKT1AKT2KMT2A | |
| SCHEMBL13707049 | 0.92 | HSD11B1 (0.38) | HSD11B1CYP2A6LMNAAKT1AKT2 | |
| SCHEMBL30358509 | 0.92 | L3MBTL1 (0.39) | HSD11B1LMNAKDM4EKMT2AHPGD | |
| SCHEMBL3094974 | 0.91 | GAA (0.33) | HSD11B1LMNAKDM4EKMT2AALDH1A1 | |
| SCHEMBL30358506 | 0.91 | GAA (0.33) | HSD11B1LMNAKDM4EKMT2AALDH1A1 | |
| SCHEMBL16355186 | 0.91 | KDM4E (0.43) | LMNAKDM4EHPGDALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1866 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250167153-A1 | METHOD OF FORMING REDISTRIBUTION PAD AND METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-05-22 | — | — | US | claimed |
| CN-119987134-A | Acrylic acid negative photoresist and preparation method and application thereof | 江苏艾森半导体材料股份有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-115576171-B | Negative photosensitive resin composition and method for preparing cured pattern | 徐州博康信息化学品有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119752458-A | Liquid crystal layer material, grating device, preparation method and display device | 广东粤港澳大湾区国家纳米科技创新研究院 | 2025-04-04 | — | — | CN | claimed |
| CN-119684517-A | Photo-cured volume holographic polymer material, grating and preparation method thereof | 广纳四维(广东)光电科技有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-119684516-A | Photo-cured volume holographic polymer material, grating and preparation method thereof | 广纳四维(广东)光电科技有限公司 | 2025-03-25 | — | — | CN | claimed |
| US-20240377736-A1 | PHOTOSENSITIVE COMPOSITION | ARKEMA FRANCE (FR) | 2024-11-14 | — | — | US | claimed |
| US-20240374769-A1 | LIGHT ACTIVATED CLEANING COMPOSITION | THE PROCTER & GAMBLE COMPANY | 2024-11-14 | — | — | US | claimed |
| CN-118011730-B | Photosensitive dry film coating and preparation method thereof | 珠海市容大感光科技有限公司 | 2024-10-22 | — | — | CN | claimed |
| CN-118798746-A | Financial data analysis management system based on big data | 北京朗杰科技有限公司 | 2024-10-18 | — | — | CN | claimed |
| EP-2852374-A1 | PROCESS FOR DYEING KERATIN FIBRES COMPRISING A DYE/PIGMENT, A PHOTOACTIVE COMPOUND AND A LIGHT SOURCE | L'Oréal (FR) | 2015-04-01 | — | — | EP | claimed |
| US-8945815-B2 | Alkaline soluble resin and light sensible resin composition comprising same and use thereof | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-02-03 | — | — | US | claimed |
| US-8828918-B2 | Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-09 | — | — | US | claimed |
| WO-2013174871-A1 | PROCESS FOR DYEING KERATIN FIBRES COMPRISING A DYE/PIGMENT, A PHOTOACTIVE COMPOUND AND A LIGHT SOURCE | L'OREAL (FR) | 2013-11-28 | — | — | WO | claimed |
| US-20130171566-A1 | ALKALINE SOLUBIE RESIN AND LIGHT SENSIBLE RESIN COMPOSITION COMPRISING SAME AND USE THEREOF | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2013-07-04 | — | — | US | claimed |
| US-7932300-B2 | Energy beam curable type ink jet printing ink | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | claimed |
| US-20110021655-A1 | THERMALLY AND ACTINICALLY CURABLE ADHESIVE COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-01-27 | — | — | US | claimed |
| EP-0706091-B2 | Liquid photoimageable resist | MACDERMID IMAGING TECHNOLOGY (US) | 2002-03-20 | — | — | EP | claimed |
| US-6045975-A | A CURABLE VARNISH BLENDS COMPRISING A NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR, A (METH)ACRYLATE ESTER POLYMERIZABLE MONOMER OR OLIGOMER, A PHOTOINITIATOR; USE IN THE PRODUCTION OF CIRCUIT BOARDS AND SEMICONDUCTOR DEVICES | FUJITSU LIMITED (JP) | 2000-04-04 | — | — | US | claimed |
| US-6013419-A | POLYIMIDE RESIN FILMS, COATING ON THE SURFACE WITH CYCLODEHYDRATION AND PHOTOPOLYMERIZATION | FUJITSU LIMITED (JP) | 2000-01-11 | — | — | US | claimed |