SCHEMBL7918792

SCHEMBL7918792

O=[N+]([O-])c1cc([N+](=O)[O-])c(/C=C/c2ccccc2)c([N+](=O)[O-])c1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 3/20 0.62
CYP19A1 P11511 2/20 0.51
TDP1 Q9NUW8 2/20 0.49
TSHR P16473 1/20 0.49
FBP1 P09467 2/20 0.47
CYP1B1 Q16678 1/20 0.46
ALDH1A1 P00352 4/20 0.45
LMNA P02545 1/20 0.45
MEN1 O00255 4/20 0.45
KMT2A Q03164 4/20 0.45
MAPT P10636 3/20 0.44
MAPK1 P28482 2/20 0.44
HTT P42858 1/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
HSP90AA1 P07900 1/20 0.44
VCP P55072 1/20 0.44
PTGS1 P23219 1/20 0.44
PTGS2 P35354 1/20 0.44
MAOB P27338 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7918794 1.00 NFE2L2 (0.62) NFE2L2CYP19A1TDP1TSHRFBP1
SCHEMBL27969970 0.90 NFE2L2 (0.57) NFE2L2CYP19A1TDP1TSHRFBP1
SCHEMBL27970001 0.85 GPR35 (0.47) NFE2L2CYP19A1TDP1TSHRALDH1A1
SCHEMBL700147 0.85 ALDH1A1 (0.52) CYP19A1TDP1TSHRALDH1A1LMNA
SCHEMBL700148 0.85 ALDH1A1 (0.52) CYP19A1TDP1TSHRALDH1A1LMNA
SCHEMBL27973587 0.83 NFE2L2 (0.53) NFE2L2CYP19A1TDP1FBP1CYP1B1
SCHEMBL3247265 0.80 NFE2L2 (0.63) NFE2L2CYP19A1TDP1TSHRCYP1B1
SCHEMBL3247258 0.80 NFE2L2 (0.63) NFE2L2CYP19A1TDP1TSHRCYP1B1
SCHEMBL28036031 0.79 FBP1 (0.59) NFE2L2CYP19A1FBP1ALDH1A1LMNA
(Z)-1,2-Diphenylethene SCHEMBL27365779 0.79 NFE2L2 (0.60) NFE2L2CYP19A1TDP1FBP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0872903-B1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder SHINETSU CHEMICAL CO (JP) 2001-10-04 EP disclosed
US-6277519-B1 QUENCHING AN ALLOY MELT; COMMINUTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-21 US disclosed
US-6096144-A TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-08-01 US disclosed
US-5858571-A TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-01-12 US disclosed
EP-0872903-A1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder Shin-Etsu Chemical Co., Ltd. (JP) 1998-10-21 EP disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed
US-3994724-A SUBSTITUTED ANILINE PHOTOCONDUCTOR SCOTT PAPER COMPANY (US) 1976-11-30 US disclosed