SCHEMBL7922533

SCHEMBL7922533

CCOC(=O)C(OCC)C(C)C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.42
LMNA P02545 2/20 0.40
HSD17B10 Q99714 1/20 0.40
ALOX15 P16050 1/20 0.39
MGAM O43451 1/20 0.39
GAA P10253 1/20 0.39
SI P14410 1/20 0.39
MGAM2 Q2M2H8 1/20 0.39
SOAT1 P35610 1/20 0.39
PIN1 Q13526 1/20 0.37
TRPA1 O75762 1/20 0.36
PTGS2 P35354 1/20 0.34
THRB P10828 1/20 0.33
HPGD P15428 1/20 0.33
MMP1 P03956 1/20 0.33
MMP2 P08253 1/20 0.33
MMP3 P08254 1/20 0.33
MMP9 P14780 1/20 0.33
MMP13 P45452 1/20 0.33
CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7920429 0.84 ABCB1 (0.44) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL17509845 0.84 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL20122619 0.84 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL9628362 0.81 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL13554956 0.81 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL31410701 0.80 ABCB1 (0.35) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL38652403 0.79 ALOX15 (0.42) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL13555010 0.79 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL13787020 0.79 PTGS2 (0.46) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL14504438 0.79 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10ALOX15MGAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP claimed
EP-0457367-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-11-21 EP claimed
EP-0211667-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-02-25 EP claimed
US-6270939-B1 STORAGE STABILITY AND SUITED FOR USE AS A RESIST FOR MAKING INTEGRATED CIRCUITS JSR CORPORATION (JP) 2001-08-07 US disclosed
US-6228554-B1 BLEND OF ALKALI SOLUBLE RESIN AND A 1,2-QUINONEDIAZIDE COMPOUND JSR CORPORATION (JP) 2001-05-08 US disclosed
US-6020104-A SOLVENT FOR BOTH ALKALI SOLUBLE RESIN AND PHOTOSENSITVE COMPOUND; STORAGE STABILITY JSR CORPORATION (JP) 2000-02-01 US disclosed
US-5925492-A STORAGE STABLE RESIN FOR PHOTORESISTS AND INTEGRATED CIRCUITS JSR CORPORATION (JP) 1999-07-20 US disclosed
US-5494784-A COATING WAFER WITH RADIATION SENSITIVE SOLUTION OF ALKALI SOLUBLE RESIN AND 1,2-QUINONEDIAZIDE COMPOUND IN OXYCARBOXYLIC ACID ESTER SOLVENT, PREBAKING, APPLYING RADIATION THROUGH MASK, DEVELOPING PATTERN JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-02-27 US disclosed
US-5405720-A A photoresists solution for integrated circuits comprising a novolak resin and photosensitive color materials JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-04-11 US disclosed
US-5238774-A Photoresists, integrated circuits JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-24 US disclosed
US-5215857-A Resists for making integrated circuits JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-06-01 US disclosed
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP disclosed
EP-0457367-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-11-21 EP disclosed
EP-0211667-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-02-25 EP disclosed