Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ABCB1 | P08183 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.38 |
| ▸ | CA12 | O43570 | 2/20 | 0.38 |
| ▸ | MGAM | O43451 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | SI | P14410 | 1/20 | 0.37 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7922533 | 0.84 | ALDH1A1 (0.42) | MGAMGAASIMGAM2LMNA | |
| SCHEMBL31410701 | 0.83 | ABCB1 (0.35) | ABCB1SMN1; SMN2MGAMGAASI | |
| SCHEMBL12626100 | 0.79 | ABCB1 (0.50) | ABCB1SMN1; SMN2CA1CA2LMNA | |
| SCHEMBL12928387 | 0.77 | ABCB1 (0.47) | ABCB1SMN1; SMN2CA14CA12MGAM | |
| SCHEMBL196133 | 0.76 | — | — | |
| SCHEMBL9628984 | 0.76 | MMP1 (0.48) | LMNAMMP1MMP2MMP3MMP9 | |
| SCHEMBL14459543 | 0.76 | — | — | |
| SCHEMBL26940409 | 0.76 | MMP1 (0.48) | LMNAMMP1MMP2MMP3MMP9 | |
| SCHEMBL926431 | 0.76 | — | — | |
| SCHEMBL13500175 | 0.76 | LMNA (0.40) | MGAMGAASIMGAM2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |
| US-6270939-B1 | STORAGE STABILITY AND SUITED FOR USE AS A RESIST FOR MAKING INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-08-07 | — | — | US | disclosed |
| US-6228554-B1 | BLEND OF ALKALI SOLUBLE RESIN AND A 1,2-QUINONEDIAZIDE COMPOUND | JSR CORPORATION (JP) | 2001-05-08 | — | — | US | disclosed |
| US-6020104-A | SOLVENT FOR BOTH ALKALI SOLUBLE RESIN AND PHOTOSENSITVE COMPOUND; STORAGE STABILITY | JSR CORPORATION (JP) | 2000-02-01 | — | — | US | disclosed |
| US-5925492-A | STORAGE STABLE RESIN FOR PHOTORESISTS AND INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5494784-A | COATING WAFER WITH RADIATION SENSITIVE SOLUTION OF ALKALI SOLUBLE RESIN AND 1,2-QUINONEDIAZIDE COMPOUND IN OXYCARBOXYLIC ACID ESTER SOLVENT, PREBAKING, APPLYING RADIATION THROUGH MASK, DEVELOPING PATTERN | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | disclosed |
| US-5405720-A | A photoresists solution for integrated circuits comprising a novolak resin and photosensitive color materials | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-04-11 | — | — | US | disclosed |
| US-5238774-A | Photoresists, integrated circuits | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-24 | — | — | US | disclosed |
| US-5215857-A | Resists for making integrated circuits | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-06-01 | — | — | US | disclosed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | disclosed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | disclosed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | disclosed |