Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26676505 | 0.78 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL9565171 | 0.78 | TSHR (0.47) | TSHRTDP1ALDH1A1 | |
| SCHEMBL14112597 | 0.77 | TSHR (0.41) | TSHRTDP1ALDH1A1 | |
| SCHEMBL825172 | 0.77 | TSHR (0.41) | TSHRTDP1ALDH1A1 | |
| SCHEMBL15096373 | 0.75 | TSHR (0.33) | TSHRTDP1ALDH1A1 | |
| SCHEMBL6251160 | 0.75 | CYP2D6 (0.37) | — | |
| SCHEMBL16493079 | 0.75 | ALDH1A1 (0.39) | TSHRTDP1ALDH1A1 | |
| SCHEMBL15098558 | 0.75 | ALDH1A1 (0.39) | TSHRTDP1ALDH1A1 | |
| SCHEMBL4564626 | 0.75 | ALDH1A1 (0.46) | TSHRTDP1ALDH1A1 | |
| SCHEMBL182496 | 0.73 | TSHR (0.43) | TSHRTDP1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2021-04-27 | — | — | US | claimed |
| EP-2650399-B1 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MAT US LLC (US) | 2019-09-11 | — | — | EP | claimed |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VERSUM MATERIALS US, LLC (US) | 2019-06-20 | — | — | US | claimed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | claimed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| US-20250188609-A1 | SEAM-FREE AND CRACK-FREE DEPOSITION | LAM RES CORP (US) | 2025-06-12 | — | — | US | disclosed |
| CN-115698141-B | Organohydrogen polysiloxane having perfluoropolyether block and method for producing same | 信越化学工业株式会社 | 2025-05-16 | — | — | CN | disclosed |
| CN-120019123-A | Coating agent | 信越化学工业株式会社 | 2025-05-16 | — | — | CN | disclosed |
| CN-119968439-A | Silicone rubber particles and aqueous dispersions of silicone rubber particles | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| US-20250038003-A1 | LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS | LAM RESEARCH CORPORATION (US) | 2025-01-30 | — | — | US | disclosed |
| US-20250014890-A1 | CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF | LAM RESEARCH CORPORATION | 2025-01-09 | — | — | US | disclosed |
| EP-1082354-A1 | PROCESS FOR MAKING ANIONIC POLYMERIC DI- AND POLYFUNCTIONAL POLYMERS USING PROTECTED FUNCTIONAL INITIATORS | SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) | 2001-03-14 | — | — | EP | disclosed |
| WO-1999060031-A1 | PROCESS FOR MAKING ANIONIC POLYMERIC DI- AND POLYFUNCTIONAL POLYMERS USING PROTECTED FUNCTIONAL INITIATORS | SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. (NL) | 1999-11-25 | — | — | WO | disclosed |
| US-5719230-A | SILICON-CONTAINING CURING AGENT, HYDROSILYLATION CATALYST | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1998-02-17 | — | — | US | disclosed |
| US-5208289-A | Polysiloxanes, acrylic resins and platinum catalysts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-05-04 | — | — | US | disclosed |
| EP-0043630-B1 | IMPROVED PROCESS FOR THE SILYLATION OF ORGANIC COMPOUNDS WITH 1,1,1-TRIMETHYL-N-(TRIMETHYLSILYL)SILANAMINE BY MEANS OF CATALYSIS WITH CERTAIN NITROGEN CONTAINING COMPOUNDS | GIST-BROCADES N.V. (NL) | 1986-01-08 | — | — | EP | disclosed |
| US-4400509-A | WITH HEXAMETHYLDISILANE WITH AN ORGANONITROGEN CATALYST | GIST-BROCADES N.V. (NL) | 1983-08-23 | — | — | US | disclosed |
| EP-0043630-A2 | Improved process for the silylation of organic compounds with 1,1,1-trimethyl-N-(trimethylsilyl)silanamine by means of catalysis with certain nitrogen containing compounds | GIST-BROCADES N.V. (NL) | 1982-01-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250014890-A1 | CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF | CNTN1, NCDN, SEPTIN6 | TSHR 4654/4885TDP1 999/4885ALDH1A1 4069/4885 |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VIM, CDH1, ALDOA | TSHR 4770/4885TDP1 2942/4885ALDH1A1 633/4885 |
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VIM, CDH1, ALDOA | TSHR 4770/4885TDP1 2942/4885ALDH1A1 633/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.