Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL182496 | 0.80 | TSHR (0.43) | TSHRTDP1ALDH1A1 | |
| SCHEMBL1975221 | 0.80 | TSHR (0.43) | TSHRTDP1ALDH1A1 | |
| SCHEMBL19176684 | 0.77 | ALDH1A1 (0.36) | TSHRTDP1ALDH1A1 | |
| SCHEMBL7928079 | 0.77 | TSHR (0.45) | TSHRTDP1ALDH1A1 | |
| SCHEMBL26090676 | 0.76 | ALDH1A1 (0.39) | TSHRTDP1ALDH1A1 | |
| SCHEMBL15685015 | 0.74 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL4947212 | 0.74 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL4630501 | 0.74 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL4630474 | 0.74 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL9565171 | 0.73 | TSHR (0.47) | TSHRTDP1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116802773-A | Liquid phase conformal silicon oxide spin-on deposition | 东京毅力科创株式会社 | 2023-09-22 | — | — | CN | claimed |
| WO-2022169934-A1 | LIQUID PHASE CONFORMAL SILICON OXIDE SPIN-ON DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2022-08-11 | — | — | WO | claimed |
| US-20220254630-A1 | LIQUID PHASE CONFORMAL SILICON OXIDE SPIN-ON DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2022-08-11 | — | — | US | claimed |
| WO-2022164730-A1 | METHOD FOR SELECTIVE DEPOSITION OF DIELECTRIC ON DIELECTRIC | TOKYO ELECTRON LIMITED (JP) | 2022-08-04 | — | — | WO | claimed |
| US-20220238323-A1 | METHOD FOR SELECTIVE DEPOSITION OF DIELECTRIC ON DIELECTRIC | TOKYO ELECTRON LIMITED (JP) | 2022-07-28 | — | — | US | claimed |
| US-7491653-B1 | Metal-free catalysts for pulsed deposition layer process for conformal silica laminates | NOVELLUS SYSTEMS, INC. (US) | 2009-02-17 | — | — | US | claimed |
| US-7271112-B1 | Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry | NOVELLUS SYSTEMS, INC. (US) | 2007-09-18 | — | — | US | claimed |
| US-7135418-B1 | Optimal operation of conformal silica deposition reactors | NOVELLUS SYSTEMS, INC. (US) | 2006-11-14 | — | — | US | claimed |
| US-7109129-B1 | Optimal operation of conformal silica deposition reactors | NOVELLUS SYSTEMS, INC. (US) | 2006-09-19 | — | — | US | claimed |
| US-20260125799-A1 | FILM FORMING METHOD AND FILM FORMING APPARATUS | TOKYO ELECTRON LTD (JP) | 2026-05-07 | — | — | US | disclosed |
| US-20260117371-A1 | FILM FORMING METHOD AND FILM FORMING APPARATUS | TOKYO ELECTRON LTD (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20250293021-A1 | FILM FORMING METHOD AND FILM FORMING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2025-09-18 | — | — | US | disclosed |
| US-20250226210-A1 | FILM FORMATION METHOD AND SUBSTRATE PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2025-07-10 | — | — | US | disclosed |
| US-20250224676-A1 | FILM FORMING METHOD AND FILM FORMING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2025-07-10 | — | — | US | disclosed |
| US-7163899-B1 | Localized energy pulse rapid thermal anneal dielectric film densification method | NOVELLUS SYSTEMS, INC. (US) | 2007-01-16 | — | — | US | disclosed |
| US-7148155-B1 | Sequential deposition/anneal film densification method | NOVELLUS SYSTEMS, INC. (US) | 2006-12-12 | — | — | US | disclosed |
| US-7135418-B1 | Optimal operation of conformal silica deposition reactors | NOVELLUS SYSTEMS, INC. (US) | 2006-11-14 | — | — | US | disclosed |
| US-7129189-B1 | Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD) | NOVELLUS SYSTEMS, INC. (US) | 2006-10-31 | — | — | US | disclosed |
| US-7109129-B1 | Optimal operation of conformal silica deposition reactors | NOVELLUS SYSTEMS, INC. (US) | 2006-09-19 | — | — | US | disclosed |
| US-6867152-B1 | Properties of a silica thin film produced by a rapid vapor deposition (RVD) process | NOVELLUS SYSTEMS, INC. (US) | 2005-03-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260117371-A1 | FILM FORMING METHOD AND FILM FORMING APPARATUS | SCO2, PPOX, LPO | TSHR 1066/4885TDP1 3721/4885ALDH1A1 2365/4885 |
| US-20260125799-A1 | FILM FORMING METHOD AND FILM FORMING APPARATUS | CFD, CDH1, FTO | TSHR 160/4885TDP1 924/4885ALDH1A1 3426/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.