Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADH1A | P07327 | 4/20 | 0.43 |
| ▸ | ADH1C | P00326 | 3/20 | 0.43 |
| ▸ | ADH1B | P00325 | 1/20 | 0.43 |
| ▸ | PHGDH | O43175 | 2/20 | 0.38 |
| ▸ | FDPS | P14324 | 1/20 | 0.38 |
| ▸ | FAAH | O00519 | 1/20 | 0.38 |
| ▸ | MGLL | Q99685 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.33 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6567110 | 1.00 | ADH1A (0.43) | ADH1AADH1CADH1BPHGDHFDPS | |
| SCHEMBL16974433 | 1.00 | ADH1A (0.43) | ADH1AADH1CADH1BPHGDHFDPS | |
| SCHEMBL11787657 | 0.97 | ADH1A (0.41) | ADH1AADH1CADH1BPHGDHFDPS | |
| SCHEMBL522367 | 0.97 | ADH1A (0.39) | ADH1AADH1CADH1BPHGDHFDPS | |
| SCHEMBL29058702 | 0.88 | ADH1B (0.31) | ADH1AADH1CADH1B | |
| SCHEMBL8764158 | 0.88 | ADH1B (0.31) | ADH1AADH1CADH1B | |
| SCHEMBL6333593 | 0.81 | FDPS (0.46) | ADH1AADH1CADH1BPHGDHFDPS | |
| SCHEMBL3397896 | 0.79 | ADH1C (0.40) | ADH1AADH1CADH1BPHGDHFDPS | |
| SCHEMBL9949553 | 0.79 | ADH1C (0.40) | ADH1AADH1CADH1BPHGDHFDPS | |
| SCHEMBL9949832 | 0.79 | ADH1C (0.40) | ADH1AADH1CADH1BPHGDHFDPS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4851 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250368845-A1 | LOW-VISCOSITY FLUX COMPOSITION FOR PRINTING USING DIGITAL INKJET HEAD | JETBEST CORP (TW) | 2025-12-04 | — | — | US | claimed |
| US-12359125-B2 | Silicon etchant composition, pattern formation method and manufacturing method of array substrate using the etchant composition, and array substrate manufactured therefrom | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-07-15 | — | — | US | claimed |
| CN-120025793-A | Cooling liquid and preparation method thereof | 江苏龙蟠新材料科技有限公司 | 2025-05-23 | — | — | CN | claimed |
| US-12128350-B2 | Water-lean carbon dioxide absorbent and method for capturing carbon dioxide by using same | CE-TEK CO., LTD. (KR) | 2024-10-29 | — | — | US | claimed |
| EP-3684887-B1 | ETCHING SOLUTION FOR SIMULTANEOUSLY REMOVING SILICON AND SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| CN-113039039-B | Polishing composition and method of use thereof | 富士胶片电子材料美国有限公司 | 2024-07-26 | — | — | CN | claimed |
| CN-118339245-A | Polishing slurry composition | 凯斯科技股份有限公司 | 2024-07-12 | — | — | CN | claimed |
| CN-109570131-B | Microsphere cleaning device and method | 中国工程物理研究院激光聚变研究中心 | 2024-04-12 | — | — | CN | claimed |
| CN-117821147-A | Groove edge regulator of vegetable oil-based cutting fluid and preparation method thereof | 南京科润工业介质股份有限公司 | 2024-04-05 | — | — | CN | claimed |
| US-20240042376-A1 | WATER-LEAN CARBON DIOXIDE ABSORBENT AND METHOD FOR CAPTURING CARBON DIOXIDE BY USING SAME | CE-TEK CO., LTD. (KR) | 2024-02-08 | — | — | US | claimed |
| CN-102131885-A | Chemical mechanical polishing composition containing polysilicon polish finisher | TECHNO SEMICHEM CO LTD | 2011-07-20 | — | — | CN | claimed |
| US-20110124195-A1 | Chemical Mechanical Polishing Composition Containing Polysilicon Polish Finisher | TECHNO SEMICHEM CO., LTD. (KR) | 2011-05-26 | — | — | US | claimed |
| CN-102015803-A | Aqueous dispersions of cationic film-forming polyurethanes | LAMBERTI SPA | 2011-04-13 | — | — | CN | claimed |
| US-20110045741-A1 | Auto-Stopping Abrasive Composition for Polishing High Step Height Oxide Layer | TECHNO SEMICHEM CO., LTD. (KR) | 2011-02-24 | — | — | US | claimed |
| CN-101208404-A | Auto-stopping abrasive composition for polishing high step height oxide layer | TECHNO SEMICHEM CO LTD (KR) | 2008-06-25 | — | — | CN | claimed |
| WO-2006115393-A1 | AUTO-STOPPING ABRASIVE COMPOSITION FOR POLISHING HIGH STEP HEIGHT OXIDE LAYER | TECHNO SEMICHEM CO., LTD. (KR) | 2006-11-02 | — | — | WO | claimed |
| US-4759861-A | Consists of an aliphatic mono- or di-carboxylic acid, a dimer or trimer of said dicarboxylic acid, petroleum sulfonic acid and naphthenic acid or salt | NIPPON OIL CO., LTD. (JP) | 1988-07-26 | — | — | US | claimed |
| US-4734449-A | POLYOLEFIN STABILIZERS AGAINST LIGHT DECOMPOSITION | CIBA-GEIGY CORPORATION (US) | 1988-03-29 | — | — | US | claimed |
| EP-0140297-A2 | Thiocarbamic-acid esters as stabilizers | CIBA-GEIGY AG (CH) | 1985-05-08 | — | — | EP | claimed |
| US-3937753-A | FIBERS, FILMS, FABRICS, BLOCK COPOLYMER | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1976-02-10 | — | — | US | claimed |