SCHEMBL7929400

SCHEMBL7929400

POC(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.44
MAPK1 P28482 1/20 0.42
KCNN4 O15554 5/20 0.41
ALDH1A1 P00352 3/20 0.41
TSHR P16473 2/20 0.41
ALOX15 P16050 1/20 0.39
CYP1A2 P05177 2/20 0.33
TAAR1 Q96RJ0 1/20 0.33
PTPN1 P18031 1/20 0.32
ESR1 P03372 1/20 0.32
CYP3A4 P08684 1/20 0.32
ESR2 Q92731 1/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8973 0.75 KIF11 (0.48) KIF11MAPK1KCNN4ALDH1A1TSHR
SCHEMBL297786 0.75 MAPK1 (0.52) KIF11MAPK1KCNN4ALDH1A1TSHR
Ammonia Solution, Strong SCHEMBL23726528 0.73 KIF11 (0.46) KIF11MAPK1KCNN4ALDH1A1TSHR
Bromide SCHEMBL28557682 0.73 KIF11 (0.46) KIF11MAPK1KCNN4ALDH1A1TSHR
Hydrochloric Acid SCHEMBL28556207 0.73 KIF11 (0.46) KIF11MAPK1KCNN4ALDH1A1TSHR
SCHEMBL3676402 0.72 MAPK1 (0.50) MAPK1KCNN4ALDH1A1TSHRALOX15
SCHEMBL328834 0.71 KIF11 (0.44) KIF11MAPK1KCNN4ALDH1A1TSHR
SCHEMBL6074049 0.71 TSHR (0.48) KIF11MAPK1KCNN4ALDH1A1TSHR
SCHEMBL11558547 0.71 MAPK1 (0.48) KIF11MAPK1KCNN4ALDH1A1TSHR
SCHEMBL297104 0.71 ALDH1A1 (0.56) KIF11MAPK1KCNN4ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118234830-A Selective wet etching composition and method 恩特格里斯公司 2024-06-21 CN claimed
CN-118085973-A Post-chemical mechanical polishing formulations and methods of use thereof 恩特格里斯公司 2024-05-28 CN claimed
CN-107552006-B Porous solid supported metal-based ionic liquid for enriching HCl gas 浙江工业大学 2021-04-06 CN claimed
CN-107651651-A A kind of porosu solid supported ion liquid of absorption HCl gases 浙江工业大学 2018-02-02 CN claimed
CN-107552006-A A kind of porosu solid loaded metal matrix ionic liquid of enrichment HCl gases 浙江工业大学 2018-01-09 CN claimed
CN-116281950-B Separation and purification method of fluorocarbon gas 大连科利德光电子材料有限公司 2025-01-10 CN disclosed
CN-118672078-A Treatment liquid and method for forming photoresist pattern using the same 日本化药株式会社 2024-09-20 CN disclosed
CN-118672079-A Treatment liquid and method for forming photoresist pattern using the same 日本化药株式会社 2024-09-20 CN disclosed
CN-116281950-A Separation and purification method of fluorocarbon gas 大连科利德光电子材料有限公司 2023-06-23 CN disclosed
CN-107980042-B Aryldihydro-2H-benzo [ b ] [1,4] oxazine sulfonamides and related compounds as ROR gamma agonists and for the treatment of disease 莱斯拉公司 2021-10-08 CN disclosed
CN-107651651-A A kind of porosu solid supported ion liquid of absorption HCl gases 浙江工业大学 2018-02-02 CN disclosed
CN-107552006-A A kind of porosu solid loaded metal matrix ionic liquid of enrichment HCl gases 浙江工业大学 2018-01-09 CN disclosed
US-6313259-B1 ESTER INTERCHANGE OF AROMATIC DIOL AND CARBONIC ACID DIESTER IN PRESENCE OF DEFOAMING AGENT; COLORLESS, DISCOLORATION INHIBITION MITSUBISHI CHEMICAL CORPORATION (JP) 2001-11-06 US disclosed
EP-1081175-A2 Process for producing aromatic polycarbonate and aromatic polycarbonate composition MITSUBISHI CHEMICAL CORPORATION (JP) 2001-03-07 EP disclosed
US-4683319-A POLYSILOXANE REACTED WITH AROMATIC AMINOPHENOL, VISCOSITY STABILIZER TORAY SILICONE CO., LTD. (JP) 1987-07-28 US disclosed