SCHEMBL7944010

SCHEMBL7944010

COC(=O)[Si](C(=O)OC)(c1ccccc1)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.46
KCNN4 O15554 1/20 0.42
KMT2A Q03164 1/20 0.42
SRC P12931 1/20 0.38
CES2 O00748 2/20 0.38
CES1 P23141 2/20 0.38
HPGD P15428 3/20 0.38
MAPT P10636 2/20 0.38
MAPK1 P28482 2/20 0.38
CYP2C19 P33261 1/20 0.38
ALOX12 P18054 1/20 0.38
HTT P42858 1/20 0.38
LMNA P02545 1/20 0.38
HSD17B10 Q99714 4/20 0.37
KDM4E B2RXH2 1/20 0.37
CASP3 P42574 1/20 0.37
RAB9A P51151 1/20 0.37
SENP8 Q96LD8 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
SENP6 Q9GZR1 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9938923 0.80 TSHR (0.45) TSHRKCNN4KMT2ASRCCES2
SCHEMBL14760071 0.73 CES2 (0.48) TSHRCES2CES1HPGDMAPT
SCHEMBL28992408 0.72 CES1 (0.41) TSHRKMT2ACES2CES1HPGD
SCHEMBL7944012 0.70 TSHR (0.54) TSHRKMT2ASRCCES2CES1
SCHEMBL15053482 0.70 ALDH1A1 (0.44) TSHRKMT2AHPGDMAPTHTT
SCHEMBL22279924 0.68 KMT2A (0.42) TSHRKCNN4KMT2AHPGDMAPT
SCHEMBL28861341 0.68 MAPT (0.41) TSHRKCNN4KMT2ACES2CES1
SCHEMBL11408419 0.68 ALDH1A1 (0.41) KMT2ACES2CES1HPGDMAPT
SCHEMBL14760178 0.67 MAPT (0.47) TSHRKCNN4KMT2ACES2CES1
SCHEMBL11029567 0.67 CES1 (0.48) TSHRKMT2ACES2CES1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0709415-B1 Substrat coated by a base-coat and a clear coat, method of film-forming and coated articles NOF CORP (JP) 2001-07-25 EP disclosed
US-6030571-A Methods of molding and molded articles made thereby NOF CORPORATION (JP) 2000-02-29 US disclosed
US-5922633-A THERMAL LATENT ACID CATALYST CONSISTS OF AN EPOXY COMPOUND, A SULFUR COMPOUND AND LEWIS ACID NOF CORPORATION (JP) 1999-07-13 US disclosed
US-5661219-A AN ACRYLIC COPOLYMER HAVING CARBOXY GROUPS BLOCKED BY A VINYL ETHER, A REACTIVE POLYMER, E.G.HAVING EPOXY GROUPS, AND LEWIS ACID-COMPLEX CATALYST; HIGH SOLIDS; LOW TEMPERATURE CURING; STORAGE STABILITY; MECHANICAL PROPERTIES NOF CORPORATION (JP) 1997-08-26 US disclosed
EP-0643112-B1 Curable composition, thermal latent acid catalyst, method of coating, coated article, method of molding and molded article NOF CORP (JP) 1997-07-30 EP disclosed
EP-0709415-A2 Curable base-coat composition, method of film-forming and coated articles NOF CORPORATION (JP) 1996-05-01 EP disclosed
EP-0643112-A2 Curable composition, thermal latent acid catalyst, method of coating, coated article, method of molding and molded article NOF CORPORATION (JP) 1995-03-15 EP disclosed