Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 3/20 | 0.46 |
| ▸ | KDM1A | O60341 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | MTNR1A | P48039 | 3/20 | 0.35 |
| ▸ | MTNR1B | P49286 | 3/20 | 0.35 |
| ▸ | BTN3A1 | O00481 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL794807 | 0.95 | ELANE (0.50) | ELANEKDM1AALDH1A1TSHRCA2 | |
| SCHEMBL12923375 | 0.88 | ELANE (0.47) | ELANEALDH1A1TSHRCA2 | |
| SCHEMBL12770088 | 0.87 | ALDH1A1 (0.42) | ELANEALDH1A1TSHRCA2HPGD | |
| SCHEMBL795385 | 0.87 | ELANE (0.58) | ELANEKDM1AALDH1A1CA2ATM | |
| SCHEMBL8322043 | 0.87 | ELANE (0.58) | ELANEKDM1AALDH1A1CA2ATM | |
| SCHEMBL8323108 | 0.81 | ELANE (0.66) | ELANEKDM1ACA2 | |
| SCHEMBL8323468 | 0.81 | ELANE (0.51) | ELANEKDM1AALDH1A1CA2L3MBTL1 | |
| SCHEMBL21771812 | 0.80 | ALDH1A1 (0.42) | ELANEALDH1A1TSHRCA2ATM | |
| SCHEMBL794937 | 0.80 | ELANE (0.50) | ELANEKDM1AALDH1A1TSHRCA2 | |
| SCHEMBL10589902 | 0.79 | ELANE (0.49) | ELANEKDM1AALDH1A1CA2ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120070783-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-03-22 | — | — | US | disclosed |