Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 3/20 | 0.50 |
| ▸ | KDM1A | O60341 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | MAPKAPK2 | P49137 | 2/20 | 0.34 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | OGA | O60502 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.33 |
| ▸ | ACACB | O00763 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL795409 | 0.95 | ELANE (0.46) | ELANEKDM1ACA2ALDH1A1TSHR | |
| SCHEMBL8323108 | 0.85 | ELANE (0.66) | ELANEKDM1ACA2MAPKAPK2MEN1 | |
| SCHEMBL794937 | 0.84 | ELANE (0.50) | ELANEKDM1ACA2ALDH1A1TSHR | |
| SCHEMBL12923375 | 0.82 | ELANE (0.47) | ELANECA2ALDH1A1TSHR | |
| SCHEMBL12770088 | 0.81 | ALDH1A1 (0.42) | ELANECA2ALDH1A1TSHRMEN1 | |
| SCHEMBL8322043 | 0.80 | ELANE (0.58) | ELANEKDM1ACA2ALDH1A1MEN1 | |
| SCHEMBL795385 | 0.80 | ELANE (0.58) | ELANEKDM1ACA2ALDH1A1MEN1 | |
| SCHEMBL9658092 | 0.80 | ELANE (0.58) | ELANEKDM1ACA2ALDH1A1TSHR | |
| SCHEMBL8319671 | 0.79 | ELANE (0.57) | ELANEKDM1ACA2ALDH1A1MAPKAPK2 | |
| SCHEMBL1788254 | 0.77 | MAPT (0.47) | CA2ALDH1A1TSHRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9523911-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | JSR CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9188858-B2 | Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound | JSR CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9152044-B2 | — | — | 2015-10-06 | — | — | US | disclosed |
| US-9104102-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-08-11 | — | — | US | disclosed |
| US-8980529-B2 | Radiation-sensitive resin composition, polymer, and resist pattern-forming method | JSR CORPORATION (JP) | 2015-03-17 | — | — | US | disclosed |
| US-20140342288-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8889335-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889888-B2 | Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-20130244185-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-09-19 | — | — | US | disclosed |
| US-20130177848-A1 | Polymer, Resist Material Containing Same, and Method for Forming Pattern Using Same | CENTRAL GLASS COMPANY LIMITED (JP) | 2013-07-11 | — | — | US | disclosed |
| US-20130095428-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-04-18 | — | — | US | disclosed |
| US-20130078579-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND | JSR CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-03-14 | — | — | US | disclosed |
| US-20120295198-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120070783-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-7897821-B2 | Sulfonium compound | JSR CORPORATION (JP) | 2011-03-01 | — | — | US | disclosed |
| US-20110014569-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130244185-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | GLRA3, RER1, RXRG | ELANE 980/4885KDM1A 2717/4885CA2 1085/4885 |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | GLRA3, RER1, FPR3 | ELANE 981/4885KDM1A 2771/4885CA2 1021/4885 |
| US-20130078579-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND | RER1, RAD51, RFT1 | ELANE 863/4885KDM1A 1214/4885CA2 1188/4885 |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | ASIC1, FGFR1, PFAS | ELANE 4527/4885KDM1A 940/4885CA2 60/4885 |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | RER1, ASIC1, GAR1 | ELANE 1499/4885KDM1A 1032/4885CA2 807/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.