SCHEMBL795757

SCHEMBL795757

C=C(C)C(=O)OC(C)CC(C)(OC(=O)OC(C)(C)C)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10267640 0.89 TSHR (0.33) TSHR
SCHEMBL12447352 0.85 TSHR (0.34) TSHR
SCHEMBL15281557 0.85 TSHR (0.30) TSHR
SCHEMBL2619168 0.82
SCHEMBL14865702 0.80 TSHR (0.39) TSHR
SCHEMBL13515124 0.80 TSHR (0.39) TSHR
SCHEMBL15000216 0.80 TSHR (0.39) TSHR
SCHEMBL9610671 0.78 TSHR (0.38) TSHR
SCHEMBL10062514 0.78
SCHEMBL12567078 0.78 TSHR (0.33) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10023827-B2 Cleaning composition for semiconductor substrate and cleaning method JSR CORPORATION (JP) 2018-07-17 US disclosed
US-20170240851-A1 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD JSR CORPORATION (JP) 2017-08-24 US disclosed
US-20160032227-A1 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD JSR CORPORATION (JP) 2016-02-04 US disclosed
US-8758978-B2 Radiation-sensitive resin composition, resist pattern formation method, and polymer JSR CORPORATION (JP) 2014-06-24 US disclosed
US-8697331-B2 Compound, polymer, and radiation-sensitive composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20120171612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER JSR CORPORATION (JP) 2012-07-05 US disclosed
US-20120070783-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2012-03-22 US disclosed
US-20110151378-A1 RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2011-06-23 US disclosed
US-20110104611-A1 NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2011-05-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110104611-A1 NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION MRE11, ERCC2, XRCC5 TSHR 2965/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.