SCHEMBL12447352

SCHEMBL12447352

C=C(C)C(=O)OC(C)CC(C)(OC(=O)C(F)(F)F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18121627 0.87 TSHR (0.35) TSHR
SCHEMBL795757 0.85 TSHR (0.34) TSHR
SCHEMBL10475863 0.85 TSHR (0.34) TSHR
SCHEMBL17861199 0.82 TSHR (0.32) TSHR
SCHEMBL14865702 0.80 TSHR (0.39) TSHR
SCHEMBL13515124 0.80 TSHR (0.39) TSHR
SCHEMBL15000216 0.80 TSHR (0.39) TSHR
SCHEMBL17776094 0.79 TSHR (0.32) TSHR
SCHEMBL9610671 0.78 TSHR (0.38) TSHR
SCHEMBL12567078 0.78 TSHR (0.33) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9513548-B2 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound JSR CORPORATION (JP) 2016-12-06 US disclosed
US-20160179003-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND JSR CORPORATION (JP) 2016-06-23 US disclosed
US-20140212813-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND JSR CORPORATION (JP) 2014-07-31 US disclosed
US-8728706-B2 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound JSR CORPORATION (JP) 2014-05-20 US disclosed
US-20120237875-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND JSR CORPORATION (JP) 2012-09-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120237875-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND RER1, RDX, PRXL2A TSHR 1194/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.