SCHEMBL7979228

SCHEMBL7979228

CCN(CC)c1ccc(C=Nc2ccc(O)c3ccccc23)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 15/20 0.51
KDM4E B2RXH2 10/20 0.51
GAA P10253 5/20 0.51
MAPT P10636 16/20 0.47
RAB9A P51151 4/20 0.47
NPC1 O15118 3/20 0.47
ESRRG P62508 2/20 0.45
KMT2A Q03164 7/20 0.44
MEN1 O00255 6/20 0.44
HPGD P15428 5/20 0.44
CYP3A4 P08684 2/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2D6 P10635 1/20 0.44
CYP2C9 P11712 1/20 0.44
ALOX12 P18054 1/20 0.44
CYP2C19 P33261 1/20 0.44
RECQL P46063 1/20 0.44
LMNA P02545 3/20 0.44
TDP1 Q9NUW8 3/20 0.44
SMN1; SMN2 Q16637 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7974522 0.83 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7974520 0.83 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7962873 0.78 ALDH1A1 (0.54) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7962875 0.78 ALDH1A1 (0.54) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7976665 0.76 ALDH1A1 (0.51) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7976667 0.76 ALDH1A1 (0.51) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7962892 0.75 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL7962895 0.75 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL11803841 0.73 ALDH1A1 (0.67) ALDH1A1KDM4EGAAMAPTRAB9A
SCHEMBL11803837 0.73 ALDH1A1 (0.67) ALDH1A1KDM4EGAAMAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268108-B1 MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-31 US disclosed
US-6087068-A AS INTERLAYER INTERPOSED BETWEEN SURFACE OF SUBSTRATE AND A PHOTORESIST LAYER TO DECREASE ADVERSE INFLUENCES BY REFLECTION OF LIGHT ON SUBSTRATE SURFACE IN PATTERN-WISE EXPOSURE OF PHOTO-RESIST LAYER TO ULTRAVIOLET RADIATION TOKYO OHKA KOGYO CO., LTD. (JP) 2000-07-11 US disclosed
EP-0803777-B1 Undercoating composition for photolithographic resist TOKYO OHKA KOGYO CO LTD (JP) 2000-07-05 EP disclosed
US-6083665-A Photoresist laminate and method for patterning using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2000-07-04 US disclosed
US-6071673-A Method for the formation of resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2000-06-06 US disclosed
US-5939510-A COMPRISES AN ULTRAVIOLET BENZOPHENONE ABSORBER, NITROGEN-CONTAINING ORGANIC CROSSLINKING AGENT, AND 2,2',4,4'-TETRAHYDROXYBENZOPHENONE TOKYO OHKA KOGYA CO., LTD. (JP) 1999-08-17 US disclosed
US-5925495-A Photoresist laminate and method for patterning using the same TOKYO OHKA KOGYO CO., LTD. (JP) 1999-07-20 US disclosed
EP-0803777-A1 Undercoating composition for photolithographic resist TOKYO OHKA KOGYO CO., LTD. (JP) 1997-10-29 EP disclosed