SCHEMBL79661

SCHEMBL79661

CC(C)N(C(C)O)C(C)O

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL35663 0.92 ALDH1A1 (0.39) ALDH1A1LMNAPOLB
SCHEMBL37338 0.82 ALDH1A1 (0.46) ALDH1A1LMNA
SCHEMBL7083879 0.78 ALDH1A1 (0.42) ALDH1A1LMNA
SCHEMBL1267233 0.78 ALDH1A1 (0.42) ALDH1A1LMNA
SCHEMBL5595182 0.78 ALDH1A1 (0.42) ALDH1A1LMNA
SCHEMBL1535125 0.78 ALDH1A1 (0.42) ALDH1A1LMNA
Hydrochloric Acid SCHEMBL81805 0.78 ALDH1A1 (0.42) ALDH1A1LMNA
SCHEMBL3638600 0.78 ALDH1A1 (0.42) ALDH1A1LMNA
Fluoride SCHEMBL923683 0.78 ALDH1A1 (0.42) ALDH1A1LMNA
SCHEMBL2051248 0.78 ALDH1A1 (0.42) ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 914 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12558648-B2 Amine compound, acid gas absorbent, method for removing acid gas, and acid gas removal apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2026-02-24 US claimed
US-12359125-B2 Silicon etchant composition, pattern formation method and manufacturing method of array substrate using the etchant composition, and array substrate manufactured therefrom DONGWOO FINE-CHEM CO., LTD. (KR) 2025-07-15 US claimed
CN-118480173-B Cationic polyester and preparation method and application thereof 深圳市信必递生物科技有限公司 2025-02-07 CN claimed
US-12128350-B2 Water-lean carbon dioxide absorbent and method for capturing carbon dioxide by using same CE-TEK CO., LTD. (KR) 2024-10-29 US claimed
CN-118480173-A Cationic polyester and preparation method and application thereof 深圳市信必递生物科技有限公司 2024-08-13 CN claimed
CN-113039039-B Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2024-07-26 CN claimed
CN-117986486-A Ionic liquid modified antibacterial antifouling aqueous polyurethane emulsion and preparation method thereof 浙江亚厦装饰股份有限公司 2024-05-07 CN claimed
US-20240042376-A1 WATER-LEAN CARBON DIOXIDE ABSORBENT AND METHOD FOR CAPTURING CARBON DIOXIDE BY USING SAME CE-TEK CO., LTD. (KR) 2024-02-08 US claimed
EP-4045226-B1 POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM ELECTRONIC MAT USA INC (US) 2024-01-03 EP claimed
CN-117229108-A Liquid preparation containing urease inhibitor and application thereof 金仓农业科技(上海)有限公司 2023-12-15 CN claimed
WO-2008043855-A1 METHOD OF INHIBITING NITROSAMINE FORMATION IN WATERBORNE COATINGS. TAMINCO (BE) 2008-04-17 WO claimed
WO-2006115393-A1 AUTO-STOPPING ABRASIVE COMPOSITION FOR POLISHING HIGH STEP HEIGHT OXIDE LAYER TECHNO SEMICHEM CO., LTD. (KR) 2006-11-02 WO claimed
EP-1395357-B1 PUMPABLE LIQUID SURFACTANT COMPOSITIONS COMPRISING ALKANOLAMINE SALTS OF ALKYL PHOSPHATE ESTERS RHODIA (US) 2006-10-04 EP claimed
US-20060100411-A1 Organometallic-free polyurethanes having low extractables LUBRIZOL ADVANCED MATERIALS, INC. 2006-05-11 US claimed
EP-1572773-A1 ORGANOMETALLIC-FREE POLYURETHANES HAVING LOW EXTRACTABLES Noveon IP Holdings Corp. (US) 2005-09-14 EP claimed
WO-2004060954-A1 ORGANOMETALLIC-FREE POLYURETHANES HAVING LOW EXTRACTABLES NOVEON IP HOLDINGS CORP. (US) 2004-07-22 WO claimed
US-20040122202-A1 Organometallic-free polyurethanes having low extractables NOVEON, INC. 2004-06-24 US claimed
EP-0088485-B2 A PROCESS FOR THE REMOVAL OF HYDROGEN SULFIDE FROM GASEOUS MIXTURES WITH STRONGLY BASIC TERTIARY AMINO COMPOUNDS EXXON RESEARCH AND ENGINEERING COMPANY (US) 1989-09-13 EP claimed
EP-0256896-A2 Cerium alcanolatoamines RHONE-POULENC CHIMIE (FR) 1988-02-24 EP claimed
US-4016115-A Unsaturated polyester resin composition containing titanium dioxide TOYO BOSEKI KABUSHIKI KAISHA (JA) 1977-04-05 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12558648-B2 Amine compound, acid gas absorbent, method for removing acid gas, and acid gas removal apparatus ADRB2, ADRA1D, HRH2 ALDH1A1 771/4885LMNA 2136/4885POLB 1290/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.