SCHEMBL7976154

SCHEMBL7976154

COc1n[c]nc2ccccc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
CYP1A2 P05177 3/20 0.48
CYP2C19 P33261 2/20 0.48
POLB P06746 1/20 0.44
MAPT P10636 3/20 0.44
NR1I3 Q14994 2/20 0.41
LMNA P02545 2/20 0.41
HTT P42858 1/20 0.41
CYP3A4 P08684 1/20 0.41
VDR P11473 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2B6 P20813 1/20 0.41
AHR P35869 1/20 0.41
MAPK1 P28482 2/20 0.40
SMN1; SMN2 Q16637 4/20 0.38
KDM4E B2RXH2 2/20 0.38
ADORA3 P0DMS8 1/20 0.37
HPGD P15428 3/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
MPO P05164 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL637621 0.79 KMT2A (0.48) ALDH1A1CYP1A2CYP2C19POLBMAPT
SCHEMBL636951 0.79 MAPT (0.47) ALDH1A1POLBMAPTLMNAHTT
SCHEMBL637578 0.77 LMNA (0.59) ALDH1A1CYP1A2CYP2C19POLBMAPT
SCHEMBL7053228 0.73 RAB9A (0.56) ALDH1A1CYP1A2CYP2C19MAPTLMNA
SCHEMBL30117773 0.73 RAB9A (0.56) ALDH1A1CYP1A2CYP2C19MAPTLMNA
SCHEMBL637547 0.72 ALDH1A1 (0.45) ALDH1A1CYP1A2POLBMAPTLMNA
SCHEMBL6042690 0.72 LMNA (0.68) ALDH1A1CYP1A2CYP2C19POLBMAPT
SCHEMBL1995850 0.71 NR1I3 (0.56) ALDH1A1CYP1A2CYP2C19POLBMAPT
SCHEMBL30264816 0.71 CYP1A2 (0.47) ALDH1A1CYP1A2CYP2C19POLBMAPT
Hydrochloric Acid SCHEMBL28183130 0.71 LMNA (0.66) ALDH1A1CYP1A2CYP2C19POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268514-B1 TREATING INDUSTRIAL MATERIALS WITH NITROETHANE COMPOUND FOR PROTECTING AGAINST ATTACK AND DESTRUCTION BY MICROORGANISMS BASF AKTIENGESELLSCHAFT (DE) 2001-07-31 US disclosed