Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.49 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.47 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | BCL2 | P10415 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | NSD2 | O96028 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3657409 | 0.91 | MEN1 (0.47) | AMY1ACYP2C9CYP2C19SMN1; SMN2HSPA5 | |
| SCHEMBL8051907 | 0.79 | MEN1 (0.45) | AMY1ACYP2C9CYP2C19SMN1; SMN2HIF1A | |
| SCHEMBL5519204 | 0.79 | PRKCE (0.45) | AMY1ACYP2C9CYP2C19SMN1; SMN2HIF1A | |
| SCHEMBL5521164 | 0.79 | PRKCE (0.45) | AMY1ACYP2C9CYP2C19SMN1; SMN2HIF1A | |
| SCHEMBL12430315 | 0.78 | AMY1A (0.61) | AMY1ACYP2C9CYP2C19SMN1; SMN2HIF1A | |
| SCHEMBL14447159 | 0.74 | AMY1A (0.56) | AMY1ACYP2C9CYP2C19SMN1; SMN2HIF1A | |
| SCHEMBL910132 | 0.74 | KDM4E (0.47) | SMN1; SMN2MEN1KMT2AHPGDCYP3A4 | |
| SCHEMBL12786465 | 0.73 | HPGD (0.68) | AMY1ACYP2C9CYP2C19SMN1; SMN2HIF1A | |
| SCHEMBL20810333 | 0.73 | ALOX15 (0.40) | AMY1ACYP2C9CYP2C19SMN1; SMN2HIF1A | |
| SCHEMBL7756363 | 0.72 | AMY1A (0.50) | AMY1ACYP2C9CYP2C19SMN1; SMN2HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0658807-B1 | Positive-working photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2000-04-05 | — | — | EP | disclosed |
| US-6030748-A | PHOTOSENSITIVE LAYER OF A HYDROLYZED AND POLYCONDENSED POLYMER OF ORGANOSILICONE OR ORGANOMETALLIC COMPOUND MONOMER IN A SOLVENT HAVING DISSOLVED THEREIN A PHENOL COMPOUND OR AN ORGANIC PHOSPHORIC ACID | FUJI PHOTO FILM CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| EP-0644460-B1 | Positive working photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1999-12-08 | — | — | EP | disclosed |
| EP-0677789-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1999-11-24 | — | — | EP | disclosed |
| EP-0753795-B1 | Positive working photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0764884-B1 | Positive working photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1999-09-01 | — | — | EP | disclosed |
| EP-0886183-A1 | Positive-working photoresist composition | Fuji Photo Film Co., Ltd. (JP) | 1998-12-23 | — | — | EP | disclosed |
| US-5709977-A | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-01-20 | — | — | US | disclosed |
| EP-0684521-B1 | Positive working photosensitive compositions | FUJI PHOTO FILM CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5652081-A | PHENOLIC RESIN | FUJI PHOTO FILM CO., LTD. (JP) | 1997-07-29 | — | — | US | disclosed |
| US-5529881-A | ALKALI-SOLUBLE RESIN AND 1,2-NAPHTHOQUINONEDIAZIDE SULFONIC ACID ESTER OF SPECIFIED POLYHYDROXY COMPOUND AS PHOTOSENSITIVE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1996-06-25 | — | — | US | disclosed |
| US-5523396-A | ESTERIFICATION OF POLYHYDROXY COMPOUND WITH 1,2-NAPHTHOQUINONEDIAZIDE-5-SULFONYL CHLORIDE IN THE PRESENCE OF A BASIC CATALYST | FUJI PHOTO FILM CO., LTD. (JP) | 1996-06-04 | — | — | US | disclosed |
| EP-0710886-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-05-08 | — | — | EP | disclosed |
| EP-0706089-A2 | Process for synthesizing quinonediazide ester and positive working photoresist containing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1996-04-10 | — | — | EP | disclosed |
| US-5494773-A | MIXTURE WITH A 1,2-QUINONEDIAZIDE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1996-02-27 | — | — | US | disclosed |
| EP-0684521-A1 | Positive working photosensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0677789-A1 | Positive photoresist composition | Fuji Photo Film Co., Ltd. (JP) | 1995-10-18 | — | — | EP | disclosed |
| EP-0672952-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-09-20 | — | — | EP | disclosed |
| EP-0658807-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-21 | — | — | EP | disclosed |
| EP-0644460-A1 | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-03-22 | — | — | EP | disclosed |