Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.48 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.39 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL197544 | 0.97 | ESR1 (0.44) | ESR1ESR2NR1H2NR1H3TSHR | |
| SCHEMBL10319247 | 0.92 | ESR1 (0.43) | ESR1ESR2NR1H2NR1H3ACHE | |
| SCHEMBL23211688 | 0.92 | ESR1 (0.41) | ESR1ESR2NR1H2NR1H3TSHR | |
| SCHEMBL10319854 | 0.90 | ACHE (0.46) | ESR1ESR2NR1H2NR1H3TSHR | |
| SCHEMBL10319284 | 0.84 | CA4 (0.52) | LMNAACHEALDH1A1TDP1KMT2A | |
| SCHEMBL10320598 | 0.84 | ALDH1A1 (0.46) | ESR1ESR2TSHRLMNAMAPT | |
| SCHEMBL10319681 | 0.84 | ESR1 (0.38) | ESR1ESR2LMNAMAPTTDP1 | |
| SCHEMBL10318823 | 0.84 | NR1H2 (0.43) | ESR1ESR2NR1H2NR1H3TSHR | |
| SCHEMBL10317741 | 0.84 | LTA4H (0.50) | NR1H2TSHRLMNASMN1; SMN2 | |
| SCHEMBL10319292 | 0.84 | TP53 (0.52) | ESR1ESR2TSHRLMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-60047026-A | — | — | None | — | — | JP | disclosed |
| JP-61118745-A | — | — | None | — | — | JP | disclosed |
| EP-0661332-B1 | Silicon-containing reactive polymer and curable resin composition comprising the same | KANEGAFUCHI CHEMICAL IND (JP) | 2000-04-12 | — | — | EP | disclosed |
| US-6025117-A | USING POLYSILANE COPOLYMER OR DENDRIMER FILM PATTERN AS MASK FOR ETCHING INSULATING OR CONDUCTING LAYER ON SUBSTRATE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-02-15 | — | — | US | disclosed |
| EP-0673960-B1 | Method for producing polysilanes | OSAKA GAS CO LTD (JP) | 1999-12-08 | — | — | EP | disclosed |
| US-5641849-A | Method for producing polysilanes | OSAKA GAS COMPANY LIMITED (JP) | 1997-06-24 | — | — | US | disclosed |
| EP-0673960-A1 | Method for producing polysilanes | OSAKA GAS CO., LTD. (JP) | 1995-09-27 | — | — | EP | disclosed |
| EP-0661332-A2 | Silicon-containing reactive polymer and curable resin composition comprising the same | Kanegafuchi Chemical Industry Co., Ltd. (JP) | 1995-07-05 | — | — | EP | disclosed |
| EP-0129834-B1 | PHOTO AND RADIATION-SENSITIVE ORGANOPOLYMERIC MATERIAL | HITACHI, LTD. (JP) | 1988-03-23 | — | — | EP | disclosed |
| JP-S61118745-A | LIGHT ND RADIATION SENSITIVE ORGANIC POLYMER | HITACHI LTD | 1986-06-06 | — | — | JP | disclosed |
| US-4544729-A | Photo and radiation-sensitive organopolymeric material | HITACHI, LTD. (JP) | 1985-10-01 | — | — | US | disclosed |
| JP-S6047026-A | NOVEL POLYMER | HITACHI LTD | 1985-03-14 | — | — | JP | disclosed |