SCHEMBL8041723

SCHEMBL8041723

CC1=CCCCC1C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
SIRT1 Q96EB6 2/20 0.35
HSD11B1 P28845 1/20 0.31
POLB P06746 1/20 0.31
CASP6 P55212 1/20 0.31
CTDSP1 Q9GZU7 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
MCL1 Q07820 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1782840 0.83 CHRNB2 (0.30)
SCHEMBL8054370 0.82 CXCR2 (0.32)
SCHEMBL10573037 0.80 ALDH1A1 (0.34)
SCHEMBL29096101 0.76 GSTP1 (0.35) TDP1
SCHEMBL164696 0.75 SIRT1 (0.32) SIRT1MCL1
SCHEMBL8053371 0.75 GRM4 (0.32) POLBMCL1
SCHEMBL13509509 0.75 SIRT1 (0.30) SIRT1
SCHEMBL28689338 0.73 SIRT1 (0.31) SIRT1MCL1
SCHEMBL29043688 0.73 SIRT1 (0.31) SIRT1MCL1
Potassium SCHEMBL30537008 0.73 SIRT1 (0.31) SIRT1MCL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230341777-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT NISSAN CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-20230341777-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT NISSAN CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230259028-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
US-20230259028-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
CN-102070566-A New aliphatic epoxy compound and preparation method thereof DALIAN TRICO CHEMICAL CO LTD 2011-05-25 CN disclosed
CN-1285350-A 1-cyclenes tetraazolelinketone and the like BAYER AGROCHEM KK (JP) 2001-02-28 CN disclosed
CN-1061650-C 1-cycloalkenyl tetrazolinones BAYER AGROCHEM KK (JP) 2001-02-07 CN disclosed
EP-0728750-B1 1-Cycloalkenyltetrazolinones BAYER AGROCHEM KK (JP) 2000-05-17 EP disclosed
US-5654257-A HERBICIDES NIHON BAYER AGROCHEM K.K. (JP) 1997-08-05 US disclosed
CN-1134418-A 1-cycloalkenyl tetrazolinones BAYER AGROCHEM KK (JP) 1996-10-30 CN disclosed
EP-0728750-A1 1-Cycloalkenyltetrazolinones NIHON BAYER AGROCHEM K.K. (JP) 1996-08-28 EP disclosed