Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 1/20 | 0.34 |
| ▸ | HTR2A | P28223 | 1/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.34 |
| ▸ | HRH1 | P35367 | 1/20 | 0.34 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.34 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.34 |
| ▸ | HTR2B | P41595 | 1/20 | 0.34 |
| ▸ | HTR3A | P46098 | 1/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.34 |
| ▸ | DRD2 | P14416 | 1/20 | 0.32 |
| ▸ | DRD3 | P35462 | 1/20 | 0.32 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.31 |
| ▸ | HTR2C | P28335 | 1/20 | 0.31 |
| ▸ | HTR5A | P47898 | 1/20 | 0.31 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.30 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8665624 | 0.78 | NOTUM (0.32) | DRD2DRD3NOTUM | |
| SCHEMBL2962277 | 0.76 | SLC6A2 (0.33) | SLC6A2HTR2ASLC6A4HRH1OPRD1 | |
| SCHEMBL276578 | 0.74 | SLC6A2 (0.35) | SLC6A2HTR2ASLC6A4HRH1OPRD1 | |
| SCHEMBL3784850 | 0.73 | CYP1A2 (0.35) | SLC6A2HTR2ASLC6A4HRH1OPRD1 | |
| SCHEMBL276579 | 0.73 | BCL2L1 (0.39) | SLC6A2HTR2ASLC6A4HRH1OPRD1 | |
| SCHEMBL2974474 | 0.73 | TRPA1 (0.36) | SLC6A2HTR2ASLC6A4HRH1OPRD1 | |
| SCHEMBL11662214 | 0.73 | CYP3A4 (0.35) | SLC6A2HTR2ASLC6A4HRH1OPRD1 | |
| SCHEMBL4854314 | 0.73 | SLC6A2 (0.37) | SLC6A2HTR2ASLC6A4HRH1OPRD1 | |
| SCHEMBL8765141 | 0.73 | SLC6A2 (0.34) | SLC6A2HTR2ASLC6A4HRH1OPRD1 | |
| SCHEMBL31285053 | 0.73 | TRPA1 (0.36) | SLC6A2HTR2ASLC6A4HRH1OPRD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11208509-B2 | Polymer compound for conductive polymer and method for producing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-28 | — | — | US | disclosed |
| US-20200291145-A1 | POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-17 | — | — | US | disclosed |
| US-20200247926-A1 | POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-06 | — | — | US | disclosed |
| US-10559397-B2 | Conductive polymer composite and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-11 | — | — | US | disclosed |
| US-10515735-B2 | — | — | 2019-12-24 | — | — | US | disclosed |
| US-20190180888-A1 | CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-13 | — | — | US | disclosed |
| US-10240061-B2 | Conductive polymer composite and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-26 | — | — | US | disclosed |
| EP-2947126-B1 | CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE | SHINETSU CHEMICAL CO (JP) | 2019-02-13 | — | — | EP | disclosed |
| US-10023752-B2 | Conductive material and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20140080064-A1 | RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-20 | — | — | US | disclosed |
| US-20140065544-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140065544-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| CN-1984874-B | Aromatic amine derivative and organic electroluminescent element using same | IDEMITSU KOSAN CO | 2012-09-26 | — | — | CN | disclosed |
| US-6087292-A | Metallocene catalysts comprising indenyl ligands substituted with electronegative groups | TANGOR GMBH (DE) | 2000-07-11 | — | — | US | disclosed |
| US-5763542-A | Process for the preparation of an olefin polymer using specific metallocenes | TARGOR GMBH (DE) | 1998-06-09 | — | — | US | disclosed |
| EP-0505972-B1 | Process for producing styrenic copolymer | IDEMITSU KOSAN CO (JP) | 1997-06-11 | — | — | EP | disclosed |
| US-5504232-A | Process for the preparation of an olefin polymer using specific metallocenes | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-04-02 | — | — | US | disclosed |
| EP-0505972-A2 | Process for producing styrenic copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | disclosed |
| US-4985576-A | Bisindenyl derivative, and a process for the preparation thereof | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-01-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200247926-A1 | POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND | HCN4, HCN2, HCN3 | SLC6A2 187/4885HTR2A 3332/4885SLC6A4 551/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.