SCHEMBL8046879

SCHEMBL8046879

CC(C)c1ccc(S(=O)(=O)c2cc(S(=O)(=O)c3ccccc3)ccc2O)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.58
POLB P06746 3/20 0.58
GFER P55789 1/20 0.58
L3MBTL1 Q9Y468 1/20 0.49
ALDH1A1 P00352 3/20 0.46
PKM P14618 1/20 0.46
MAPT P10636 2/20 0.45
KDM4E B2RXH2 1/20 0.45
LMNA P02545 1/20 0.45
CNR2 P34972 1/20 0.45
CHRM2 P08172 2/20 0.43
CHRM1 P11229 2/20 0.43
MEN1 O00255 1/20 0.42
PABPC1 P11940 1/20 0.42
KMT2A Q03164 1/20 0.42
ATM Q13315 1/20 0.42
ERAP1 Q9NZ08 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
MCL1 Q07820 1/20 0.41
RNASEH1 O60930 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8058757 1.00 GAA (0.58) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL8064345 0.94 POLB (0.53) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL660467 0.87 GAA (0.73) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL6534882 0.87 GAA (0.73) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL8047007 0.83 L3MBTL1 (0.68) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL8046971 0.83 POLB (0.69) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL8529006 0.83 POLB (0.69) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL8057552 0.83 L3MBTL1 (0.68) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL8526863 0.83 GAA (0.77) GAAPOLBGFERL3MBTL1ALDH1A1
SCHEMBL4616465 0.82 ALDH1A1 (0.61) GAAPOLBALDH1A1PKMMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed